⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Formaldehyde SCHEMBL19179874 | 0.82 | — | — | |
| Formaldehyde SCHEMBL17976791 | 0.82 | — | — | |
| Formaldehyde SCHEMBL19064483 | 0.82 | — | — | |
| Carbon Monoxide SCHEMBL8092431 | 0.82 | — | — | |
| Carbon Monoxide SCHEMBL8044682 | 0.82 | — | — | |
| Formaldehyde SCHEMBL25319009 | 0.82 | — | — | |
| Carbon Monoxide SCHEMBL215940 | 0.82 | — | — | |
| Carbon Monoxide SCHEMBL137595 | 0.82 | — | — | |
| Carbon Monoxide SCHEMBL1513215 | 0.82 | — | — | |
| Carbon Monoxide SCHEMBL6697573 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1131475-A1 | NICKEL CARBONYL VAPOUR DEPOSITION APPARATUS AND PROCESS | Chemical Vapour Deposition Systems Inc. (CA) | 2001-09-12 | — | — | EP | disclosed |
| US-6132518-A | Nickel carbonyl vapour deposition apparatus and method | CHEMICAL VAPOUR DEPOSITION SYSTEMS, INC. | 2000-10-17 | — | — | US | disclosed |
| WO-2000026432-A1 | NICKEL CARBONYL VAPOUR DEPOSITION APPARATUS AND PROCESS | CHEMICAL VAPOUR DEPOSITION SYSTEMS INC. (CA) | 2000-05-11 | — | — | WO | disclosed |
| US-6048578-A | Closed loop carbon monoxide self-contained nickel carbonyl deposition process | CHEMICAL VAPOUR DEPOSITION SYSTEMS, INC. | 2000-04-11 | — | — | US | disclosed |