SCHEMBL7780167

SCHEMBL7780167

COC1(OC)[CH]C=CC=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17027519 0.81
SCHEMBL5075375 0.81
SCHEMBL8621927 0.78
SCHEMBL15474944 0.72
SCHEMBL1190737 0.69
SCHEMBL458233 0.69
SCHEMBL592904 0.67
SCHEMBL6676233 0.67
SCHEMBL3116228 0.67
SCHEMBL11393742 0.66

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118302462-A Polymer composition and single layer phase difference material 日产化学株式会社 2024-07-05 CN disclosed
CN-118290880-A Polymer composition and single layer phase difference material 日产化学株式会社 2024-07-05 CN disclosed
CN-117677669-A Polymer composition and single layer phase difference material 日产化学株式会社 2024-03-08 CN disclosed
CN-113557265-B Polymer composition and single layer phase difference material 日产化学株式会社 2024-03-08 CN disclosed
CN-113574119-B Polymer composition and single layer phase difference material 日产化学株式会社 2024-01-16 CN disclosed
CN-117186663-A Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element 日产化学工业株式会社 2023-12-08 CN disclosed
CN-108139632-B Liquid crystal display element 日产化学工业株式会社 2023-12-05 CN disclosed
US-11817553-B2 Deep eutectic solvent-based gel polymer electrolytes THE JOHNS HOPKINS UNIVERSITY (US) 2023-11-14 US disclosed
CN-113167957-B Liquid crystal aligning agent, liquid crystal alignment film, and phase difference material 日产化学株式会社 2023-09-26 CN disclosed
CN-116601191-A Method for producing single-layer retardation film, and polymer composition for forming single-layer retardation film 日产化学株式会社 2023-08-15 CN disclosed
CN-116323702-A Method for producing single-layer phase difference material 日产化学株式会社 2023-06-23 CN disclosed
US-20210301087-A1 CATIONICALLY POLYMERIZABLE COMPOSITION JNC CORPORATION (JP) 2021-09-30 US disclosed
US-20200343586-A1 Deep Eutectic Solvent-Based Gel Polymer Electrolytes JOHNS HOPKINS UNIVERSITY 2020-10-29 US disclosed
EP-0718695-B1 Water-developable photosensitive resin composition NIPPON PAINT CO LTD (JP) 2001-09-19 EP disclosed
EP-0759577-B1 LIQUID PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHY ASAHI CHEMICAL IND (JP) 1999-07-28 EP disclosed
EP-0759577-A1 LIQUID PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHY Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1997-02-26 EP disclosed
EP-0718695-A2 Water-developable photosensitive resin composition Nippon Paint Co., Ltd. (JP) 1996-06-26 EP disclosed