Dimethylamine

Dimethylamine

SCHEMBL7787583

CNC.[Br-].[H+]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHKACHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGHRH2OPRM1

The experimentally established mechanism targets of Dimethylamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Dimethylamine SCHEMBL8071298 0.91
Dimethylamine SCHEMBL8071363 0.91
Dimethylamine SCHEMBL28656316 0.83
Dimethylamine SCHEMBL8353101 0.83
Dimethylamine SCHEMBL27901555 0.83
Dimethylamine SCHEMBL31261319 0.83
Dimethylamine SCHEMBL787169 0.83
Dimethylamine SCHEMBL12415750 0.82
Dimethylamine SCHEMBL5164633 0.82
Dimethylamine SCHEMBL1030 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112996756-B Water treatment agent 栗田工业株式会社 2023-12-08 CN disclosed
CN-112996756-A Water treatment agent 栗田工业株式会社 2021-06-18 CN disclosed
US-10184052-B2 Near infrared radiation-absorbing composition, near infrared radiation cut-off filter and production method therefor, and camera module and production method therefor FUJIFILM CORPORATION (JP) 2019-01-22 US disclosed
US-20170227690-A1 NEAR INFRARED RAY ABSORBENT COMPOSITION, NEAR INFRARED RAY CUT FILTER, SOLID IMAGE PICKUP ELEMENT, AND CAMERA MODULE FUJIFILM CORPORATION (JP) 2017-08-10 US disclosed
US-20160304730-A1 NEAR INFRARED RADIATION-ABSORBING COMPOSITION, NEAR INFRARED RADIATION CUT-OFF FILTER AND PRODUCTION METHOD THEREFOR, AND CAMERA MODULE AND PRODUCTION METHOD THEREFOR FUJIFILM CORPORATION (JP) 2016-10-20 US disclosed
EP-0670525-B1 Liquid developer compositions XEROX CORP (US) 2001-11-28 EP disclosed
EP-0670525-A1 Liquid developer compositions XEROX CORPORATION (US) 1995-09-06 EP disclosed
US-5411834-A Copolymer of ethylene and fluoroalkyl acrylate XEROX CORPORATION (US) 1995-05-02 US disclosed
US-5409796-A Modified copolymer of ethylene and methacrylic acid ester as charge adjuvant XEROX CORPORATION (US) 1995-04-25 US disclosed