⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8836485 | 0.94 | — | — | |
| SCHEMBL14159185 | 0.94 | — | — | |
| SCHEMBL18069233 | 0.94 | — | — | |
| SCHEMBL11680323 | 0.94 | — | — | |
| SCHEMBL11680490 | 0.94 | — | — | |
| SCHEMBL13324642 | 0.83 | — | — | |
| SCHEMBL133947 | 0.82 | — | — | |
| SCHEMBL4326201 | 0.79 | — | — | |
| SCHEMBL9785074 | 0.79 | — | — | |
| SCHEMBL677683 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180221269-A1 | LIGHTENING METHOD USING SPECIAL SILOXANE COMPOUNDS | HENKEL AG & CO. KGAA (DE) | 2018-08-09 | — | — | US | disclosed |
| US-9957403-B2 | Aqueous dispersion of hydrophobically modified pigment particles | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2018-05-01 | — | — | US | disclosed |
| EP-3147329-A1 | HEAT-CURABLE SILICONE RESIN COMPOSITION, OPTICAL SEMICONDUCTOR DEVICE AND SEMICONDUCTIOR PACKAGE USING MOLDED PRODUCT OF SAME | Shin-Etsu Chemical Co., Ltd. (JP) | 2017-03-29 | — | — | EP | disclosed |
| US-20170022384-A1 | Aqueous Dispersion of Hydrophobically Modified Pigment Particles | ROHM AND HAAS COMPANY | 2017-01-26 | — | — | US | disclosed |
| EP-1764652-B1 | Positive resist composition and pattern-forming method using the same | FUJIFILM CORP (JP) | 2014-10-22 | — | — | EP | disclosed |
| WO-2013160252-A2 | DRY SILICONE GELS AND THEIR METHODS OF MAKING USING THIOL-ENE CHEMISTRY | TYCO ELECTRONICS RAYCHEM BVBA (BE) | 2013-10-31 | — | — | WO | disclosed |
| US-20080305055-A1 | Anti-Radical Agents | CIBA CORPORATION | 2008-12-11 | — | — | US | disclosed |
| EP-0698632-B1 | Process for preparing organosiloxane terminated with silanol group | SHINETSU CHEMICAL CO (JP) | 2001-11-21 | — | — | EP | disclosed |
| US-5576408-A | Process for preparing low molecular weight organosiloxane terminated with silanol group | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1996-11-19 | — | — | US | disclosed |
| EP-0698632-A1 | Process for preparing organosiloxane terminated with silanol group | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1996-02-28 | — | — | EP | disclosed |
| US-RE29211-E | HEXAMETHYL-CYCLO-TRISILOXANE, METHANOL | SWS SILICONES CORPORATION (US) | 1977-05-10 | — | — | US | disclosed |
| US-3979546-A | HYDROPHOBIC | SWS SILICONES CORPORATION (US) | 1976-09-07 | — | — | US | disclosed |