Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.57 |
| ▸ | CA4 | P22748 | 3/20 | 0.41 |
| ▸ | PAOX | Q6QHF9 | 3/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.38 |
| ▸ | BLM | P54132 | 1/20 | 0.38 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | GABRR1 | P24046 | 2/20 | 0.33 |
| ▸ | FFAR3 | O14843 | 2/20 | 0.33 |
| ▸ | HDAC3 | O15379 | 2/20 | 0.33 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.33 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.33 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.33 |
| ▸ | GLRA1 | P23415 | 1/20 | 0.33 |
| ▸ | SLC6A9 | P48067 | 1/20 | 0.33 |
| ▸ | OR51E2 | Q9H255 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL4860103 | 0.93 | CA1 (0.57) | CA1CA4PAOXLMNAALOX15 | |
| Acetic Acid SCHEMBL11880014 | 0.93 | CA1 (0.57) | CA1CA4PAOXLMNAALOX15 | |
| Acetic Acid SCHEMBL6832533 | 0.93 | CA1 (0.57) | CA1CA4PAOXLMNAALOX15 | |
| Acetic Acid SCHEMBL245760 | 0.93 | CA1 (0.57) | CA1CA4PAOXLMNAALOX15 | |
| Acetic Acid SCHEMBL22398545 | 0.93 | CA1 (0.57) | CA1CA4PAOXLMNAALOX15 | |
| Acetic Acid SCHEMBL11302391 | 0.93 | CA1 (0.57) | CA1CA4PAOXLMNAALOX15 | |
| Acetic Acid SCHEMBL3672410 | 0.93 | CA1 (0.57) | CA1CA4PAOXLMNAALOX15 | |
| Acetic Acid SCHEMBL16714034 | 0.93 | CA1 (0.57) | CA1CA4PAOXLMNAALOX15 | |
| Acetic Acid SCHEMBL6348789 | 0.93 | CA1 (0.57) | CA1CA4PAOXLMNAALOX15 | |
| Acetic Acid SCHEMBL10686706 | 0.93 | CA1 (0.57) | CA1CA4PAOXLMNAALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4598041-A | Self-processing photographic film unit with dissolvable trap member | FUJI PHOTO FILM CO., LTD. (JP) | 1986-07-01 | — | — | US | claimed |
| EP-4371548-B1 | METHOD FOR APPLYING AN OPAQUE IMPARTING LIQUID FOR ZIRCONIA | SHOFU INC (JP) | 2025-11-05 | — | — | EP | disclosed |
| EP-4371548-A2 | OPAQUE IMPARTING LIQUID FOR ZIRCONIA | Shofu Inc. (JP) | 2024-05-22 | — | — | EP | disclosed |
| EP-3575277-B1 | OPAQUE IMPARTING LIQUID FOR ZIRCONIA | SHOFU INC (JP) | 2024-05-08 | — | — | EP | disclosed |
| US-11622840-B2 | Opaque imparting liquid for zirconia | SHOFU INC. (JP) | 2023-04-11 | — | — | US | disclosed |
| EP-0763581-B1 | Primer composition and optical material | NIPPON KOGAKU KK (JP) | 2001-12-05 | — | — | EP | disclosed |
| EP-0574274-B1 | Coating composition | NIPPON KOGAKU KK (JP) | 1997-08-20 | — | — | EP | disclosed |
| EP-0763581-A2 | Primer composition and optical material | NIKON CORPORATION (JP) | 1997-03-19 | — | — | EP | disclosed |
| US-5415690-A | Protective, for plastic moldings, an organosiloxane, a metal EDTA, an metal oxide particle | NIKON CORPORATION (JP) | 1995-05-16 | — | — | US | disclosed |
| EP-0574274-A2 | Coating composition | NIKON CORPORATION (JP) | 1993-12-15 | — | — | EP | disclosed |
| US-4598041-A | Self-processing photographic film unit with dissolvable trap member | FUJI PHOTO FILM CO., LTD. (JP) | 1986-07-01 | — | — | US | disclosed |
| US-4318743-A | INCLUDING A BASE HAVING A GREATER DEGREE OF BASICITY THAN THE GLASS SILICATE; WATERBASE PAINTS; UNIFORM DISPERSION | PPG INDUSTRIES, INC. (US) | 1982-03-09 | — | — | US | disclosed |