SCHEMBL7797179

SCHEMBL7797179

CC(C)C[CH]Br

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5038498 0.74
SCHEMBL28064633 0.72
SCHEMBL7873012 0.69
SCHEMBL1566999 0.69
SCHEMBL109549 0.67 TSHR (0.33)
SCHEMBL109550 0.67 TSHR (0.33)
SCHEMBL17764763 0.67 TSHR (0.33)
SCHEMBL56534 0.67
SCHEMBL11777286 0.67 ASF1A (0.34)
SCHEMBL15243821 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101553210-A Method and system for delivering a drug via inhalation NEXT SAFETY INC (US) 2009-10-07 CN claimed
CN-117887328-A Anti-reflection coating composition, preparation method and application 福建泓光半导体材料有限公司 2024-04-16 CN disclosed
CN-117866174-A Aromatic thio epoxy resin, preparation method and application 福建泓光半导体材料有限公司 2024-04-12 CN disclosed
US-10367231-B2 Magnesium-containing electrolytic solution FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-07-30 US disclosed
EP-3226340-B1 MAGNESIUM-CONTAINING ELECTROLYTIC SOLUTION FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2018-11-07 EP disclosed
CN-108004184-A A kind of bacillus and its method for producing isovaleric acid 云南中烟工业有限责任公司 2018-05-08 CN disclosed
US-20170331154-A1 MAGNESIUM-CONTAINING ELECTROLYTIC SOLUTION WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2017-11-16 US disclosed
EP-3226340-A1 MAGNESIUM-CONTAINING ELECTROLYTIC SOLUTION Wako Pure Chemical Industries, Ltd. (JP) 2017-10-04 EP disclosed
CN-107057800-A A kind of lubricating oil in esters antifriction additive 武汉轻工大学 2017-08-18 CN disclosed
CN-106608935-A Catalyst components used for olefin polymerization, catalyst and application of catalyst 中国石油化工股份有限公司 2017-05-03 CN disclosed
EP-0903340-A1 Process for production of alkoxycarbonylthioaryl compounds IHARA CHEMICAL INDUSTRY Co., Ltd. (JP) 1999-03-24 EP disclosed
US-5883285-A REACTION OF DISULFIDE WITH ALKALI METAL HYDROXIDE IN THE PRESENCE OF SULFUR COMPOUND IHARA CHEMICAL INDUSTRY CO., LTD. (JP) 1999-03-16 US disclosed
US-5750763-A REACTING THE CORRESPONDING DISULFIDE COMPOUND WITH ALKALI METAL HYDROXIDE IN PRESENCE OF A SULFUR COMPOUND; THEN HALOGENATED FATTY ACID ESTER IHARA CHEMICAL INDUSTRY CO., LTD. (JP) 1998-05-12 US disclosed
US-5744678-A NICKEL COMPOUND, ORGANOPHOSPHORUS COMPOUND, ORGANOALUMINUM COMPOUND, CARBON-HALOGEN COMPOUNDS; CATALYST SELECTIVITY NIPPON OIL CO., LTD. (JP) 1998-04-28 US disclosed
US-5728641-A Catalyst component for the polymerization of olefins NIPPON OIL COMPANY, LIMITED (JP) 1998-03-17 US disclosed
US-5693396-A NEAR INFRARED LIGHT ABSORBERS MITSUI TOATSU CHEMICALS, INC. (JP) 1997-12-02 US disclosed
EP-0758563-A1 OLEFIN OLIGOMERIZATION CATALYST AND PROCESS FOR THE PREPARATION OF OLEFIN OLIGOMER USING IT NIPPON OIL COMPANY, LTD. (JP) 1997-02-19 EP disclosed
EP-0719839-A2 Phthalocyanine compounds and optical recording media comprising them MITSUI TOATSU CHEMICALS, Inc. (JP) 1996-07-03 EP disclosed
EP-0700901-A1 PROCESSES FOR PRODUCING THIOARYL COMPOUND IHARA CHEMICAL INDUSTRY Co., Ltd. (JP) 1996-03-13 EP disclosed
EP-0587440-A2 Catalyst component for the polymerisation of olefins and process for preparing olefin polymers using same NIPPON OIL COMPANY, LIMITED (JP) 1994-03-16 EP disclosed