SCHEMBL780302

SCHEMBL780302

O=S(=O)(OC1CCCCC1)OC1CCCCC1

nearest known ligand 0.64

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CA1 P00915 4/20 0.64
CA2 P00918 3/20 0.64
CA12 O43570 3/20 0.36
CA7 P43166 2/20 0.36
CA14 Q9ULX7 2/20 0.36
EPHX1 P07099 2/20 0.33
ACHE P22303 1/20 0.33
CA9 Q16790 2/20 0.32
STS P08842 3/20 0.31
ADH1B P00325 1/20 0.30
ADH1C P00326 1/20 0.30
ADH1A P07327 1/20 0.30
NPC1 O15118 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL28150613 0.97 CA1 (0.61) CA1CA2CA12CA7CA14
SCHEMBL777246 0.97 CA1 (0.59) CA1CA2CA12CA7CA14
SCHEMBL1706406 0.91 CA1 (0.52) CA1CA2
SCHEMBL20017109 0.87 CA1 (0.56) CA1CA2CA12CA7CA14
SCHEMBL17782134 0.85 CA1 (0.54) CA1CA2CA12CA7CA14
SCHEMBL11502918 0.85 CA1 (0.60) CA1CA2CA12CA7CA14
SCHEMBL17466430 0.79 CA1 (0.48) CA1CA2ACHE
SCHEMBL17466346 0.79 CA1 (0.48) CA1CA2ACHE
SCHEMBL17429326 0.79 CA1 (0.48) CA1CA2
SCHEMBL8150883 0.79 CA1 (0.48) CA1CA2EPHX1ACHEADH1C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8557144-B2 Material for forming conductive antireflection film, method for forming conductive antireflection film, method for forming resist pattern, semiconductor device, and magnetic head FUJITSU LIMITED (JP) 2013-10-15 US claimed
EP-1192297-B1 ACIDIC BATH FOR GALVANIC DEPOSITION OF LUSTROUS GOLD AND GOLD ALLOY LAYERS AND LUSTRING ADDITIVE THERFOR DEGUSSA GALVANOTECHNIK GMBH (DE) 2007-01-10 EP claimed
EP-1244827-B1 BATH FOR ELECTROCHEMICALLY DEPOSITING HIGHLY LUSTROUS WHITE RHODIUM COATINGS AND WHITENING AGENT FOR THE SAME UMICORE GALVANOTECHNIK GMBH (DE) 2006-04-19 EP claimed
US-6878411-B2 Bath for the electrochemical deposition of high-gloss white rhodium coatings and whitening agent for the same UMICORE GALVANOTECHNIK GMBH (DE) 2005-04-12 US claimed
CN-1181226-C Electrolytic deposition bath for high gloss white rhodium coatings OMG��Ƽ������޹�˾ 2004-12-22 CN claimed
US-6814850-B1 EXTENDING CURRENT DENSITY WORKING RANGE; MINIMIZING PH EFFECT; INCREASING CURRENT EFFICIENCY AND DEPOSITION PERFORMANCE; INCLUDING SULFONATE OR SULFATE COMPONENT UMICORE GALVANOTECHNIK GMBH (DE) 2004-11-09 US claimed
US-20030111352-A1 Bath for the electrochemically depositing highly lustrous white rhodium coatings and whitening agent for the same UMICORE GALVANOTECHNIK GMBH (DE) 2003-06-19 US claimed
CN-1420948-A Bath for electrochemically depositing highly lustrous white rhodium coatings and whitening agent for same OMG ELECTROPLATING TECHNOLOGIE (DE) 2003-05-28 CN claimed
US-5547806-A ADDING A DIALKYL SULFATE AND A POLYFUNCTIONAL ISOCYANATE COMPOUND; EMULSIFICATION; POLYMERIZATION; MICROENCAPSULATION FUJI PHOTO FILM CO., LTD. (JP) 1996-08-20 US claimed
US-12100809-B2 Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2024-09-24 US disclosed
CN-113980686-B Preparation method of lateral o-difluorobenzene liquid crystal compound containing cyclohexyl 宁夏中星显示材料有限公司 2023-10-10 CN disclosed
CN-111170941-B Preparation method of 1-cyclopropyl-6, 7-difluoro-8-methoxy fluoroquinolone-3-carboxylic acid ester 江西农业大学 2023-07-25 CN disclosed
US-20220149436-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2022-05-12 US disclosed
US-11283107-B2 Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2022-03-22 US disclosed
US-5486555-A Process for production of stabilized polycarbonate TEIJIN LIMITED (JP) 1996-01-23 US disclosed
EP-0640646-A1 Process for production of stabilized polycarnonate TEIJIN LIMITED (JP) 1995-03-01 EP disclosed
CN-1071332-A HAIR SPRAY COMPOSITIONS PROCTER & GAMBLE (US) 1993-04-28 CN disclosed
US-4156773-A WITH A MONOACYL HALIDE, MONOSULFONYL HALIDE, ALKYL HALIDE, MONOCARBOXYLIC ACID ANHYDRIDE OR DIALKYL SULFATE GENERAL ELECTRIC COMPANY (US) 1979-05-29 US disclosed
US-4048143-A WITH ACYL OR SULFONYL HALIDES, ANHYDRIDES OR DIALKYL SULFATES ON GENERAL ELECTRIC COMPANY (US) 1977-09-13 US disclosed
US-3988379-A Manufacture of cyclohexanol from cyclohexene BADISCHE ANILIN- & SODA-FABRIK AKTIENGESELLSCHAFT (DT) 1976-10-26 US disclosed