⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1353412 | 0.71 | — | — | |
| Methane SCHEMBL23088734 | 0.00 | — | — | |
| Hydrogen Sulfide SCHEMBL23805181 | 0.00 | — | — | |
| SCHEMBL23528133 | 0.00 | — | — | |
| SCHEMBL23358113 | 0.00 | — | — | |
| SCHEMBL23462252 | 0.00 | — | — | |
| SCHEMBL25435013 | 0.00 | — | — | |
| SCHEMBL23462141 | 0.00 | — | — | |
| Potassium Ion SCHEMBL23462035 | 0.00 | CA4 (0.50) | — | |
| SCHEMBL23462036 | 0.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107262082-A | Hud typed oxide material, its manufacture method, exhaust gas purification catalyst and exhaust gas-cleaning method using the material | 丰田自动车株式会社 | 2017-10-20 | — | — | CN | disclosed |
| CN-105001254-A | Manufacturing methods for film-forming material, group IV metal oxide film | TOSOH CORP | 2015-10-28 | — | — | CN | disclosed |
| CN-103917487-A | Film-forming material, group IV metal oxide film, and vinylidene diamide complex | TOSOH CORP | 2014-07-09 | — | — | CN | disclosed |
| US-20010002297-A1 | Pyrotechnic layer for the targeted destruction of data on data carriers | RUAG MUNITION (CH) | 2001-05-31 | — | — | US | disclosed |