SCHEMBL7820636

SCHEMBL7820636

O=C(O)CCCCCCCCC#CC#Cc1ccccc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HMGCR P04035 4/20 0.56
▸ PTPN7 P35236 4/20 0.51
▸ FFAR1 O14842 6/20 0.51
▸ FFAR4 Q5NUL3 5/20 0.47
▸ MAPT P10636 3/20 0.46
▸ RXFP1 Q9HBX9 1/20 0.46
▸ HDAC3 O15379 1/20 0.46
▸ HDAC4 P56524 1/20 0.46
▸ HDAC1 Q13547 1/20 0.46
▸ HDAC7 Q8WUI4 1/20 0.46
▸ HDAC2 Q92769 1/20 0.46
▸ HDAC10 Q969S8 1/20 0.46
▸ HDAC11 Q96DB2 1/20 0.46
▸ HDAC8 Q9BY41 1/20 0.46
▸ HDAC6 Q9UBN7 1/20 0.46
▸ HDAC9 Q9UKV0 1/20 0.46
▸ HDAC5 Q9UQL6 1/20 0.46
▸ MMP2 P08253 1/20 0.46
▸ MMP12 P39900 1/20 0.46
▸ CYP1A2 P05177 2/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10592931 0.88 FFAR1 (0.57) HMGCRPTPN7FFAR1FFAR4MAPT
SCHEMBL8352544 0.88 FFAR1 (0.57) HMGCRPTPN7FFAR1FFAR4MAPT
SCHEMBL14007856 0.86 FFAR1 (0.57) HMGCRPTPN7FFAR1FFAR4MAPT
SCHEMBL15283823 0.85 HDAC1 (0.60) MAPTHDAC3HDAC4HDAC1HDAC7
SCHEMBL27809224 0.85 FFAR1 (0.56) HMGCRPTPN7FFAR1FFAR4MAPT
SCHEMBL14251994 0.81 CYP1A2 (0.47) FFAR1FFAR4MAPTMMP2MMP12
SCHEMBL7054026 0.81 FFAR1 (0.59) FFAR1FFAR4MAPTRXFP1HDAC3
SCHEMBL414271 0.80 HMGCR (0.80) HMGCRPTPN7FFAR1FFAR4MAPT
SCHEMBL416646 0.80 HMGCR (0.80) HMGCRPTPN7FFAR1FFAR4MAPT
SCHEMBL11139452 0.80 HMGCR (0.80) HMGCRPTPN7FFAR1FFAR4MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9163307-B2 Three-dimensional photoresists via functionalization of polymer thin films fabricated by iCVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2015-10-20 — — US claimed
US-20130260054-A1 Three-Dimensional Photoresists via Functionalization of Polymer Thin Films Fabricated by iCVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2013-10-03 — — US claimed
WO-2013148126-A1 THREE-DIMENSIONAL PHOTORESISTS VIA FUNCTIONALIZATION OF POLYMER THIN FILMS FABRICATED BY ICVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2013-10-03 — — WO claimed
US-9163307-B2 Three-dimensional photoresists via functionalization of polymer thin films fabricated by iCVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2015-10-20 — — US disclosed
US-20130260054-A1 Three-Dimensional Photoresists via Functionalization of Polymer Thin Films Fabricated by iCVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2013-10-03 — — US disclosed
WO-2013148126-A1 THREE-DIMENSIONAL PHOTORESISTS VIA FUNCTIONALIZATION OF POLYMER THIN FILMS FABRICATED BY ICVD MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2013-10-03 — — WO disclosed
EP-1091958-A1 SALTS OF PAROXETINE SMITHKLINE BEECHAM PLC (GB) 2001-04-18 — — EP disclosed
WO-2000001692-A1 SALTS OF PAROXETINE SMITHKLINE BEECHAM PLC (GB) 2000-01-13 — — WO disclosed
EP-0184193-B1 AMPHIPHILIC DIACETYLENE COMPOUND CONTAINING BENZENE RING AND FILM PREPARED THEREFROM KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1989-08-30 — — EP disclosed
US-4748273-A Amphiphilic diacetylene compound containing benzene ring and film prepared therefrom KANEGAFUSHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1988-05-31 — — US disclosed
EP-0184193-A1 Amphiphilic diacetylene compound containing benzene ring and film prepared therefrom KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1986-06-11 — — EP disclosed
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