SCHEMBL7862049

SCHEMBL7862049

[CH2]CCCCC[CH]O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7863908 1.00
SCHEMBL3241432 1.00
SCHEMBL7867106 1.00
SCHEMBL5498216 1.00
SCHEMBL7864327 1.00
SCHEMBL577819 0.97
SCHEMBL183753 0.90
SCHEMBL11567726 0.86
SCHEMBL2904875 0.86
SCHEMBL4380516 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107428651-B Liquid crystalline compound, liquid crystal composition, liquid crystal-encapsulated composite fiber, fiber aggregate, fiber composite, and liquid crystal display element 捷恩智株式会社 2021-06-22 CN disclosed
US-10913855-B2 Silicon-containing heterocyclic compound, and quencher FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2021-02-09 US disclosed
CN-109071960-B Silicon-containing heterocyclic matting agents, compounds and polymers 富士胶片和光纯药株式会社 2021-01-12 CN disclosed
EP-3165541-B1 GRAFT POLYMER, RESIN COLORED MATTER, METHOD FOR PRODUCING SAME, AND RESIN COMPOSITION CONTAINING RESIN COLORED MATTER FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2020-09-09 EP disclosed
US-10696898-B2 Reverse photochromic compound FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2020-06-30 US disclosed
CN-111218126-A Matting agent, compound and polymer 富士胶片和光纯药株式会社 2020-06-02 CN disclosed
CN-107001807-B Compound and polymer 富士胶片和光纯药株式会社 2020-04-03 CN disclosed
US-10377713-B2 Quencher FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-08-13 US disclosed
US-20190233651-A1 SILICON-CONTAINING HETEROCYCLIC COMPOUND, AND QUENCHER FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-08-01 US disclosed
EP-3476901-A1 SILICON-CONTAINING HETEROCYCLIC COMPOUND, AND QUENCHER FUJIFILM Wako Pure Chemical Corporation (JP) 2019-05-01 EP disclosed
EP-3165541-A1 GRAFT POLYMER, RESIN COLORED MATTER, METHOD FOR PRODUCING SAME, AND RESIN COMPOSITION CONTAINING RESIN COLORED MATTER Wako Pure Chemical Industries, Ltd. (JP) 2017-05-10 EP disclosed
EP-3124551-A1 RHODAMINE-BASED COLORING COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2017-02-01 EP disclosed
EP-1157694-A1 REMEDIAL AGENT FOR ERECTILE DYSFUNCTION Nissan Chemical Industries, Ltd. (JP) 2001-11-28 EP disclosed
EP-0742211-B1 PYRIDAZINONE DERIVATIVES NISSAN CHEMICAL IND LTD (JP) 2000-05-10 EP disclosed
US-5980622-A LIGHTFASTNESS; INK JET PRINTERS HEWLETT-PACKARD COMPANY (US) 1999-11-09 US disclosed
US-5750523-A INHIBITING PLATELET AGGREGATION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 1998-05-12 US disclosed
EP-0742211-A1 PYRIDAZINONE DERIVATIVE NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) 1996-11-13 EP disclosed
US-4964615-A MIXTURE OF FATTY ACID ESTER, THICKENER, AND EMULSIFIER HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 1990-10-23 US disclosed
US-4076530-A Dry photographic copying method for producing Te images FUJI PHOTO FILM CO., LTD. (JA) 1978-02-28 US disclosed
US-4062685-A ORGANO-TELLURIUM COMPOUND FUJI PHOTO FILM CO., LTD. (JA) 1977-12-13 US disclosed