SCHEMBL7889269

SCHEMBL7889269

CCCc1ccc(-c2ccccc2C(N)=S)cc1

nearest known ligand 0.44

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
PPARG P37231 4/20 0.44
LTB4R2 Q9NPC1 7/20 0.44
BRS3 P32247 2/20 0.41
AGTR1 P30556 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7900739 0.91 BRS3 (0.49) PPARGLTB4R2BRS3AGTR1
SCHEMBL7896980 0.88 PPARG (0.48) PPARGLTB4R2BRS3
SCHEMBL7896352 0.88 PPARG (0.48) PPARGLTB4R2BRS3
SCHEMBL7896340 0.87 SMN1; SMN2 (0.52) PPARGLTB4R2
SCHEMBL7899173 0.87 TDP1 (0.45) PPARGLTB4R2BRS3
SCHEMBL7900715 0.85 MAOB (0.56)
SCHEMBL15839774 0.84 PPARG (0.44) PPARGLTB4R2BRS3AGTR1
SCHEMBL7899237 0.84 LPAR1 (0.42) LTB4R2BRS3
SCHEMBL7889284 0.84 TDP1 (0.42) PPARGLTB4R2BRS3
SCHEMBL7897100 0.83 LTB4R2 (0.43) LTB4R2BRS3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6277998-B1 REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-21 US disclosed
US-6191289-B1 REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-02-20 US disclosed
US-5874593-A SULFUR CONTAINING AMIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-23 US disclosed
EP-0711762-A1 PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-05-15 EP disclosed