SCHEMBL7906992

SCHEMBL7906992

CC(C(=O)O)C1CCCCC1.[Ru]

nearest known ligand 0.43

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 6/20 0.43
CA12 O43570 2/20 0.41
CA1 P00915 2/20 0.41
CA2 P00918 2/20 0.41
MMP2 P08253 2/20 0.41
CA9 Q16790 2/20 0.41
ACE P12821 1/20 0.41
ALDH1A1 P00352 2/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38
HIF1A Q16665 1/20 0.38
DPP4 P27487 1/20 0.37
GABRA1 P14867 3/20 0.36
GABRA5 P31644 3/20 0.36
GABRB2 P47870 3/20 0.36
GABRR1 P24046 2/20 0.36
ATM Q13315 1/20 0.36
GABRA4 P48169 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27734671 0.98 EPHX1 (0.44) EPHX1CA12CA1CA2MMP2
SCHEMBL28212826 0.98 EPHX1 (0.44) EPHX1CA12CA1CA2MMP2
SCHEMBL31323959 0.98 EPHX1 (0.44) EPHX1CA12CA1CA2MMP2
SCHEMBL11922662 0.98 EPHX1 (0.44) EPHX1CA12CA1CA2MMP2
Cyclohexane SCHEMBL18344237 0.98 EPHX1 (0.44) EPHX1CA12CA1CA2MMP2
SCHEMBL1188709 0.98 EPHX1 (0.44) EPHX1CA12CA1CA2MMP2
SCHEMBL668002 0.98 EPHX1 (0.44) EPHX1CA12CA1CA2MMP2
SCHEMBL1595664 0.98 EPHX1 (0.44) EPHX1CA12CA1CA2MMP2
SCHEMBL2055541 0.98 EPHX1 (0.44) EPHX1CA12CA1CA2MMP2
Hydrochloric Acid SCHEMBL4408876 0.95 EPHX1 (0.43) EPHX1CA12CA1CA2MMP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6197366-B1 ELECTROCONDUCTIVE METAL FILM FROM LOW TEMPERATURE BAKING FROMNITRATE SALT AND CYANO COMPOUND, CARBONYL COMPOUND OR ORGANIC SALT OF METAL AND AMINO TAKAMATSU RESEARCH LABORATORY (JP) 2001-03-06 US disclosed
EP-0989205-A1 METAL PASTE AND METHOD FOR PRODUCTION OF METAL FILM Takamatsu Research Laboratory (JP) 2000-03-29 EP disclosed