⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28094645 | 0.94 | — | — | |
| SCHEMBL28368183 | 0.84 | — | — | |
| SCHEMBL11786113 | 0.82 | — | — | |
| SCHEMBL11239439 | 0.82 | — | — | |
| SCHEMBL28011347 | 0.82 | — | — | |
| SCHEMBL25272517 | 0.82 | PRKD3 (0.31) | — | |
| SCHEMBL25224624 | 0.81 | PRKD3 (0.33) | — | |
| SCHEMBL25278220 | 0.81 | PRKD3 (0.33) | — | |
| SCHEMBL5170842 | 0.81 | — | — | |
| SCHEMBL25228682 | 0.81 | PRKD3 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6218014-B1 | FUSER COMPRISING A SUPPORT AND COATED WITH AN ELASTOMERIC FLUOROCARBONS CONTAINING SILICON CARBIDE OR CUPRIC OXIDE FILLER WHICH HAVE BEEN TREATED WITH A SILANE COUPLING AGENT WITH FUNCTIONALIZED GROUP, A RELASE LAYER OF POLYSILOXANE | NEXPRESS SOLUTIONS | 2001-04-17 | — | — | US | claimed |
| US-6114041-A | FUSER MEMBER COMPRISING SUPPORT COATED WITH FLUOROELASTOMER LAYER COMPRISING METAL OXIDE FILLER TREATED WITH SILANE COUPLING AGENT | EASTMAN KODAK COMPANY (US) | 2000-09-05 | — | — | US | claimed |
| US-5998033-A | FLUOROELASTOMER | EASTMAN KODAK COMPANY (US) | 1999-12-07 | — | — | US | claimed |
| US-5935712-A | SUPPORT COATED WITH A FLUOROELASTOMER CONTAINING A THERMALLY CONDUCTIVE METAL OXIDE FILLER TREATED WITH A SILANE COUPLING AGENT THAT IS INTERACTIVE WITH THE FLUOROELASTOMER; TONER OFFSET RESISTANCE, WEAR RESISTANCE | EASTMAN KODAK COMPANY (US) | 1999-08-10 | — | — | US | claimed |
| CN-104334674-A | Cmp composition containing zirconia particles and method of use | CABOT MICROELECTRONICS CORP | 2015-02-04 | — | — | CN | disclosed |
| EP-0147618-A2 | Antimicrobial fabrics | UOP INC. (US) | 1985-07-10 | — | — | EP | disclosed |
| US-4324681-A | Chiral supports for resolution of racemates | UOP INC. (US) | 1982-04-13 | — | — | US | disclosed |