SCHEMBL7918316

SCHEMBL7918316

CC(C)(C)C1(C(=O)O)CC2C=CC1C2.CCCC1=CC(=O)NC1=O.O=C(O)C1(CCCO)CC2C=CC1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7927212 0.90
SCHEMBL7924579 0.76
SCHEMBL7927181 0.74
SCHEMBL8100307 0.73
SCHEMBL7926187 0.72
Acetic Acid SCHEMBL8099722 0.70
SCHEMBL1206903 0.69 CYP2D6 (0.36)
SCHEMBL32688908 0.69 CYP2D6 (0.38)
SCHEMBL32689218 0.67 CYP2D6 (0.41)
SCHEMBL7073285 0.66 CYP2D6 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6225020-B1 SUCH AS USED IN 4 G OR 16 G DRAM SEMICONDUCTOR DEVICES USING A LIGHT SOURCE SUCH AS ARF, AN E-BEAM, EUV, OR AN ION BEAM, PHOTORESIST FOR THE TOP SURFACE IMAGE (TSI) PROCESS USING SILYLATION, MALEIMIDE ANDNORBONENE CARBOXYLATE COMONOMERS, HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2001-05-01 US disclosed