SCHEMBL7919004

SCHEMBL7919004

Brc1cc(Br)c2[nH]c(-c3ccccc3)cc2c1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 4/20 0.57
NPC1 O15118 4/20 0.47
RAB9A P51151 4/20 0.47
DHODH Q02127 1/20 0.43
KDM4E B2RXH2 3/20 0.42
ALDH1A1 P00352 2/20 0.42
HPGD P15428 1/20 0.42
HSD17B10 Q99714 1/20 0.42
MEN1 O00255 2/20 0.41
MAPT P10636 2/20 0.41
KMT2A Q03164 2/20 0.41
LMNA P02545 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
NPY5R Q15761 2/20 0.40
CDC7 O00311 2/20 0.40
ADORA2A P29274 2/20 0.40
ADORA1 P30542 1/20 0.40
TAS2R38 P59533 1/20 0.40
CASP3 P42574 1/20 0.38
SENP8 Q96LD8 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7905115 0.83 NPC1 (0.54) CYP19A1NPC1RAB9ADHODHKDM4E
SCHEMBL16835575 0.80 DHODH (0.55) CYP19A1NPC1RAB9ADHODHKDM4E
SCHEMBL31022578 0.77 CYP19A1 (0.49) CYP19A1NPC1RAB9ADHODHKDM4E
SCHEMBL12324064 0.74 NPC1 (0.59) CYP19A1NPC1RAB9ADHODHKDM4E
SCHEMBL3976622 0.73 CYP19A1 (1.00) CYP19A1NPC1RAB9AKDM4EALDH1A1
SCHEMBL14269503 0.69 CYP19A1 (0.74) CYP19A1NPC1RAB9AKDM4EALDH1A1
SCHEMBL26045173 0.69 NPC1 (0.48) CYP19A1NPC1RAB9ADHODHKDM4E
SCHEMBL24098674 0.69 MAPT (0.40) CYP19A1ALDH1A1HPGDMEN1MAPT
SCHEMBL15020472 0.69 CYP19A1 (0.54) CYP19A1NPC1RAB9AADORA2AADORA1
SCHEMBL21660498 0.68 HPGD (0.46) NPC1RAB9AKDM4EALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0872903-B1 Method for making hydrogen storage alloy powder and electrode comprising the alloy powder SHINETSU CHEMICAL CO (JP) 2001-10-04 EP disclosed
US-6277519-B1 QUENCHING AN ALLOY MELT; COMMINUTION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-08-21 US disclosed
US-6096144-A TREATING WITH ACIDIC OR ALKALINE SOLUTION OF CONJUGATED UNSATURATED COMPOUND WITH AT LEAST 5 BONDS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-08-01 US disclosed
US-5858571-A TREATING A PULVERIZED HYDROGEN ABSORBING ALLOY WITH A SOLUTION COMPRISING A CONJUGATED UNSATURATED COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-01-12 US disclosed
EP-0872903-A1 Method for making hydrogen storage alloy powder and electrode comprising the alloy powder Shin-Etsu Chemical Co., Ltd. (JP) 1998-10-21 EP disclosed
EP-0172427-B1 PROCESS FOR PRODUCTION OF VINYL CHLORIDE POLYMER Shin-Etsu Chemical Co., Ltd. (JP) 1989-07-05 EP disclosed
US-4758639-A Process for production of vinyl polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-19 US disclosed
US-4757124-A Suspension or emulsion polymerizing vinyl chloride monomer or mixture of vinyl chloride with vinyl monomer copolymerizable therewith in reactor with walls coated with antiscaling compound containing dye or pigments SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-12 US disclosed
US-4741981-A Photosensitive material for electrophotography contains organic phosphite compounds RICOH CO., LTD. (JP) 1988-05-03 US disclosed
US-4661428-A HIGH ENERGY DENSITY; LIGHTWEIGHT SUBSTRATES RICOH CO., LTD. (JP) 1987-04-28 US disclosed
EP-0172427-A2 Process for production of vinyl chloride polymer Shin-Etsu Chemical Co., Ltd. (JP) 1986-02-26 EP disclosed
US-4521504-A DICHROMATIC IMAGES-CONDUCTIVE SUBSTRATE LAMINATED WITH PHOTOCONDUCTIVE RICOH COMPANY, LTD. (JP) 1985-06-04 US disclosed
US-4370398-A Electrostatic copying process RICOH COMPANY, LTD. (JP) 1983-01-25 US disclosed
US-4361638-A AMORPHOUS SILICON AND CARBON BASE MATERIAL DOPED WITH HYDROGEN AND FLUORINE FUJI PHOTO FILM CO., LTD. (JP) 1982-11-30 US disclosed