Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.50 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.43 |
| ▸ | CA12 | O43570 | 2/20 | 0.43 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.41 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.37 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.37 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.37 |
| ▸ | CA7 | P43166 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | MMP1 | P03956 | 1/20 | 0.32 |
| ▸ | MMP2 | P08253 | 1/20 | 0.32 |
| ▸ | MMP3 | P08254 | 1/20 | 0.32 |
| ▸ | MMP9 | P14780 | 1/20 | 0.32 |
| ▸ | MMP13 | P45452 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12951613 | 1.00 | SMN1; SMN2 (0.50) | SMN1; SMN2CA14CA12ABCB1SLC1A3 | |
| SCHEMBL18417201 | 0.85 | SMN1; SMN2 (0.55) | SMN1; SMN2CA14CA12ABCB1SLC1A3 | |
| SCHEMBL18417202 | 0.85 | SMN1; SMN2 (0.55) | SMN1; SMN2CA14CA12ABCB1SLC1A3 | |
| SCHEMBL9885889 | 0.85 | SMN1; SMN2 (0.55) | SMN1; SMN2CA14CA12ABCB1SLC1A3 | |
| SCHEMBL17293119 | 0.81 | SMN1; SMN2 (0.42) | SMN1; SMN2CA14CA12ABCB1SLC1A3 | |
| SCHEMBL18839582 | 0.81 | SMN1; SMN2 (0.42) | SMN1; SMN2CA14CA12ABCB1SLC1A3 | |
| SCHEMBL17293118 | 0.81 | SMN1; SMN2 (0.42) | SMN1; SMN2CA14CA12ABCB1SLC1A3 | |
| SCHEMBL21892103 | 0.79 | SMN1; SMN2 (0.41) | SMN1; SMN2CA14CA12ABCB1CA7 | |
| SCHEMBL16359509 | 0.78 | — | — | |
| SCHEMBL14007052 | 0.78 | SMN1; SMN2 (0.42) | SMN1; SMN2CA14CA12ABCB1SLC1A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0211667-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-03-11 | — | — | EP | claimed |
| EP-0457367-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-11-21 | — | — | EP | claimed |
| EP-0211667-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-02-25 | — | — | EP | claimed |
| EP-3881048-B1 | DEVICE FOR REMOVING VOLATILE ORGANIC COMPOUNDS | LETAT FRANCAIS REPRESENTE PAR LE MINI DE LINTERIEUR (FR) | 2026-05-06 | — | — | EP | disclosed |
| EP-3728235-B1 | SUBSTITUTED THIOPHENYLURACILS , THEIR SALTS AND USE OF SAID COMPOUNDS AS HERBICIDAL AGENTS | SYNGENTA CROP PROTECTION AG (CH) | 2022-02-09 | — | — | EP | disclosed |
| CN-113167695-A | Device for collecting volatile organic compounds | 法国由内政部代表 | 2021-07-23 | — | — | CN | disclosed |
| US-6270939-B1 | STORAGE STABILITY AND SUITED FOR USE AS A RESIST FOR MAKING INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-08-07 | — | — | US | disclosed |
| US-6228554-B1 | BLEND OF ALKALI SOLUBLE RESIN AND A 1,2-QUINONEDIAZIDE COMPOUND | JSR CORPORATION (JP) | 2001-05-08 | — | — | US | disclosed |
| US-6020104-A | SOLVENT FOR BOTH ALKALI SOLUBLE RESIN AND PHOTOSENSITVE COMPOUND; STORAGE STABILITY | JSR CORPORATION (JP) | 2000-02-01 | — | — | US | disclosed |
| US-5925492-A | STORAGE STABLE RESIN FOR PHOTORESISTS AND INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 1999-07-20 | — | — | US | disclosed |
| US-5494784-A | COATING WAFER WITH RADIATION SENSITIVE SOLUTION OF ALKALI SOLUBLE RESIN AND 1,2-QUINONEDIAZIDE COMPOUND IN OXYCARBOXYLIC ACID ESTER SOLVENT, PREBAKING, APPLYING RADIATION THROUGH MASK, DEVELOPING PATTERN | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-02-27 | — | — | US | disclosed |
| US-5405720-A | A photoresists solution for integrated circuits comprising a novolak resin and photosensitive color materials | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-04-11 | — | — | US | disclosed |
| US-5238774-A | Photoresists, integrated circuits | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-08-24 | — | — | US | disclosed |
| US-5215857-A | Resists for making integrated circuits | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-06-01 | — | — | US | disclosed |
| EP-0211667-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-03-11 | — | — | EP | disclosed |
| EP-0457367-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-11-21 | — | — | EP | disclosed |
| EP-0211667-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-02-25 | — | — | EP | disclosed |