Radium

Radium

SCHEMBL7921283

[HH].[Ra]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Strontium SCHEMBL30538689 0.71
SCHEMBL30020793 0.71
Radium SCHEMBL30265712 0.71
SCHEMBL29357126 0.71
Methane SCHEMBL17509964 0.71
Radium Ra-223 SCHEMBL29367492 0.71
SCHEMBL29411160 0.71
Radium Ra-223 SCHEMBL29368855 0.71
SCHEMBL29358724 0.71
Radium SCHEMBL29353527 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6211389-B1 TREATING SPECIFICALLY DEFINED COMBINATIONS COMPRISING AN EPOXY RESIN STARTING MATERIAL AND OTHER COMPONENTS TO ORGANIC SOLVENT, A CROWN ETHER, AND A SUITABLE BASE TO CONDITIONS SUFFICIENT TO PRODUCE A TREATED EPOXY COMPOUND DEXTER CORPORATION 2001-04-03 US claimed
US-6211389-B1 TREATING SPECIFICALLY DEFINED COMBINATIONS COMPRISING AN EPOXY RESIN STARTING MATERIAL AND OTHER COMPONENTS TO ORGANIC SOLVENT, A CROWN ETHER, AND A SUITABLE BASE TO CONDITIONS SUFFICIENT TO PRODUCE A TREATED EPOXY COMPOUND DEXTER CORPORATION 2001-04-03 US disclosed