SCHEMBL7929217

SCHEMBL7929217

OS(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.58
SMN1; SMN2 Q16637 2/20 0.58
HTR6 P50406 1/20 0.47
CA1 P00915 3/20 0.43
CA2 P00918 3/20 0.43
MMP1 P03956 1/20 0.43
MMP2 P08253 1/20 0.43
MMP9 P14780 1/20 0.43
MMP8 P22894 1/20 0.43
MMP13 P45452 1/20 0.43
CA4 P22748 3/20 0.43
CA14 Q9ULX7 3/20 0.43
ALDH1A1 P00352 3/20 0.43
CA6 P23280 2/20 0.43
CA5A P35218 2/20 0.43
CA7 P43166 2/20 0.43
CA5B Q9Y2D0 2/20 0.43
TDP1 Q9NUW8 2/20 0.43
CA12 O43570 2/20 0.43
CA3 P07451 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL11060127 0.97 TSHR (0.55) TSHRSMN1; SMN2HTR6CA1CA2
Iodide SCHEMBL11809104 0.97 TSHR (0.55) TSHRSMN1; SMN2HTR6CA1CA2
SCHEMBL2343423 0.79 TSHR (0.58) TSHRSMN1; SMN2HTR6CA1CA2
SCHEMBL28833500 0.79 TSHR (0.58) TSHRSMN1; SMN2HTR6CA1CA2
SCHEMBL4810154 0.78 TSHR (0.94) TSHRSMN1; SMN2HTR6CA1CA2
SCHEMBL5827980 0.73 TSHR (0.52) TSHRSMN1; SMN2HTR6CA1CA2
SCHEMBL21647640 0.73 TSHR (0.52) TSHRSMN1; SMN2HTR6CA1CA2
SCHEMBL10793228 0.73 TSHR (0.52) TSHRSMN1; SMN2HTR6CA1CA2
SCHEMBL597672 0.73 TSHR (1.00) TSHRSMN1; SMN2HTR6CA1CA2
SCHEMBL2818436 0.73 TSHR (0.52) TSHRSMN1; SMN2HTR6CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110908242-B Resist composition and patterning method 信越化学工业株式会社 2024-03-19 CN disclosed
CN-110908242-A Resist composition and patterning method 信越化学工业株式会社 2020-03-24 CN disclosed
US-6242654-B1 REACTING A PHENOLATE COMPOUND WITH AN ORGANIC FLUORINATING AGENT TO PREPARE A FLUORINE SUBSTITUTED AROMATIC COMPOUND MITSUI CHEMICALS, INC. (JP) 2001-06-05 US disclosed
EP-1013629-A1 Preparation process of fluorine subsituted aromatic compound Mitsui Chemicals, Inc. (JP) 2000-06-28 EP disclosed
EP-0177453-B1 IMAGE-PRODUCING PROCESS CIBA-GEIGY AG (CH) 1987-12-16 EP disclosed
US-4632891-A Process for the production of images CIBA-GEIGY CORPORATION (US) 1986-12-30 US disclosed