Dimethyl Sulfoxide

Dimethyl Sulfoxide

SCHEMBL7933303

C[S+](C)[O-].C[S+](C)[O-].C[S+](C)[O-].C[S+](C)[O-].Cl.Cl

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

MAP2K1MAP2K2

The experimentally established mechanism targets of Dimethyl Sulfoxide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0828768-B1 HOMOPOLYMERS AND COPOLYMERS OF CATIONICALLY POLYMERIZABLE MONOMERS AND METHOD OF THEIR PREPARATION GOODRICH CO B F (US) 2001-04-18 EP claimed
EP-0862589-A2 ADDITION POLYMERS OF POLYCYCLOOLEFINS CONTAINING SILYL FUNCTIONAL GROUPS THE B.F. GOODRICH COMPANY (US) 1998-09-09 EP claimed
EP-0828768-A1 HOMOPOLYMERS AND COPOLYMERS OF CATIONICALLY POLYMERIZABLE MONOMERS AND METHOD OF THEIR PREPARATION The B.F. Goodrich Company (US) 1998-03-18 EP claimed
WO-1997020871-A2 ADDITION POLYMERS OF POLYCYCLOOLEFINS CONTAINING SILYL FUNCTIONAL GROUPS THE B.F. GOODRICH COMPANY (US) 1997-06-12 WO claimed
WO-1996037529-A1 HOMOPOLYMERS AND COPOLYMERS OF CATIONICALLY POLYMERIZABLE MONOMERS AND METHOD OF THEIR PREPARATION THE B.F. GOODRICH COMPANY (US) 1996-11-28 WO claimed
WO-1995014048-A9 ADDITION POLYMERS DERIVED FROM NORBORNENE-FUNCTIONAL MONOMERS AND PROCESS THEREFOR 1995-07-27 WO claimed
EP-1021750-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 2000-07-26 EP disclosed
WO-1999014635-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 1999-03-25 WO disclosed
EP-0862589-A2 ADDITION POLYMERS OF POLYCYCLOOLEFINS CONTAINING SILYL FUNCTIONAL GROUPS THE B.F. GOODRICH COMPANY (US) 1998-09-09 EP disclosed
WO-1997020871-A2 ADDITION POLYMERS OF POLYCYCLOOLEFINS CONTAINING SILYL FUNCTIONAL GROUPS THE B.F. GOODRICH COMPANY (US) 1997-06-12 WO disclosed