SCHEMBL793814

SCHEMBL793814

CCCOC12CC3CC(O)(C1)CC(OC(=O)C(C)(C)CC)(C3)C2

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 1/20 0.30
CYP19A1 P11511 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2754856 0.91
SCHEMBL107655 0.88 CYP17A1 (0.32) CYP17A1CYP19A1
SCHEMBL14368539 0.87
SCHEMBL14368542 0.85 DPP4 (0.30)
SCHEMBL13046103 0.85 DPP8 (0.36) CYP17A1CYP19A1
SCHEMBL10260330 0.85
SCHEMBL13829172 0.84
SCHEMBL15396580 0.83 EPHX2 (0.31)
SCHEMBL14226148 0.83
SCHEMBL2607840 0.83 GRIN2D (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9348228-B2 Acid-strippable silicon-containing antireflective coating GLOBALFOUNDRIES INC. (KY) 2016-05-24 US disclosed
US-20140186774-A1 ACID-STRIPPABLE SILICON-CONTAINING ANTIREFLECTIVE COATING INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-07-03 US disclosed
US-8394573-B2 Photoresist compositions and methods for shrinking a photoresist critical dimension INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-03-12 US disclosed
US-20120070787-A1 PHOTORESIST COMPOSITIONS AND METHODS FOR SHRINKING A PHOTORESIST CRITICAL DIMENSION INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-03-22 US disclosed