⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29104896 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL16648534 | 0.95 | — | — | |
| SCHEMBL29104894 | 0.71 | — | — | |
| SCHEMBL5087586 | 0.70 | — | — | |
| Hydrochloric Acid SCHEMBL219421 | 0.62 | — | — | |
| Hydrochloric Acid SCHEMBL2117275 | 0.62 | — | — | |
| Hydrochloric Acid SCHEMBL215937 | 0.62 | — | — | |
| SCHEMBL6854906 | 0.62 | — | — | |
| Hydrochloric Acid SCHEMBL219422 | 0.62 | — | — | |
| Hydrochloric Acid SCHEMBL7629822 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114402256-A | Organic film, method for producing same, composition, laminate, and semiconductor device | 富士胶片株式会社 | 2022-04-26 | — | — | CN | disclosed |
| CN-113383273-A | Photosensitive resin composition, pattern forming method, cured film, laminate, and device | 富士胶片株式会社 | 2021-09-10 | — | — | CN | disclosed |
| CN-113168093-A | Pattern forming method, photosensitive resin composition, cured film, laminate, and device | 富士胶片株式会社 | 2021-07-23 | — | — | CN | disclosed |
| US-6245706-B1 | GROUP-4 METALLOCENE STABILIZED WITH AN ANIONIC POLYNUCLEAR BORON COMPOUND FOR IMPROVED POLYMER MOLECULAR WEIGHT CONTROL AND NARROW MOLECULAR WEIGHT DISTRIBUTION | EXXON CHEMICAL PATENTS, INC. | 2001-06-12 | — | — | US | disclosed |