Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.50 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.50 |
| ▸ | RAB9A | P51151 | 1/20 | 0.50 |
| ▸ | ERN1 | O75460 | 4/20 | 0.42 |
| ▸ | ALDH5A1 | P51649 | 3/20 | 0.42 |
| ▸ | ABAT | P80404 | 3/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | TRIM24 | O15164 | 2/20 | 0.42 |
| ▸ | TRIM33 | Q9UPN9 | 2/20 | 0.42 |
| ▸ | TYR | P14679 | 1/20 | 0.42 |
| ▸ | AOX1 | Q06278 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | CYP2A6 | P11509 | 4/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10445586 | 0.88 | KDM4E (0.64) | KDM4EPTGS2RAB9AALDH5A1ABAT | |
| SCHEMBL28970708 | 0.83 | ERN1 (0.48) | ERN1TRIM24TRIM33TYR | |
| SCHEMBL6637472 | 0.82 | TRIM24 (0.47) | ERN1TRIM24TRIM33TYRTDP1 | |
| SCHEMBL6742400 | 0.82 | TRIM24 (0.47) | ERN1TRIM24TRIM33TYRTDP1 | |
| SCHEMBL10466277 | 0.80 | TRIM24 (0.50) | ERN1TRIM24TRIM33TYRTDP1 | |
| SCHEMBL31194371 | 0.79 | TRIM24 (0.54) | ERN1TRIM24TRIM33TYRTDP1 | |
| SCHEMBL669781 | 0.79 | TRIM24 (0.54) | ERN1TRIM24TRIM33TYRTDP1 | |
| SCHEMBL668600 | 0.79 | TRIM24 (0.54) | ERN1TRIM24TRIM33TYRTDP1 | |
| SCHEMBL4367977 | 0.79 | KDM4E (0.48) | KDM4EPTGS2RAB9AALDH5A1ABAT | |
| SCHEMBL27908553 | 0.79 | ERN1 (0.63) | ERN1ALDH1A1TRIM24TRIM33TYR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8853031-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-07 | — | — | US | disclosed |
| US-20120184103-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-6252104-B1 | 3,6-DISUBSTITUTED-2-OXYNAPHTHALENE DERIVATIVES; RAW MATERIALS FOR SYNTHESIS OF SUCH MATERIALS AS DYES, PIGMENTS, PHOTOSENSITIVE MATERIALS | KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) | 2001-06-26 | — | — | US | disclosed |
| EP-0765858-B1 | NAPHTHOL DERIVATIVES AND PROCESS FOR PRODUCING THE SAME | UENO SEIYAKU OYO KENKYUJO KK (JP) | 1999-12-22 | — | — | EP | disclosed |
| US-5847233-A | Naphthol derivatives and process for producing the same | KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) | 1998-12-08 | — | — | US | disclosed |
| US-5786523-A | Naphthol derivatives and process for producing the same | KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) | 1998-07-28 | — | — | US | disclosed |
| EP-0765858-A1 | NAPHTHOL DERIVATIVES AND PROCESS FOR PRODUCING THE SAME | KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) | 1997-04-02 | — | — | EP | disclosed |