⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL37682 | 0.94 | — | — | |
| SCHEMBL19921920 | 0.88 | — | — | |
| SCHEMBL3107279 | 0.88 | — | — | |
| SCHEMBL5819702 | 0.67 | — | — | |
| SCHEMBL7131757 | 0.59 | — | — | |
| SCHEMBL11989009 | 0.59 | — | — | |
| SCHEMBL7129498 | 0.59 | — | — | |
| SCHEMBL21273791 | 0.59 | — | — | |
| SCHEMBL25337267 | 0.56 | — | — | |
| SCHEMBL7979315 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110643973-B | NaV2O5Preparation method of crystal film | 西安近代化学研究所 | 2021-11-23 | — | — | CN | claimed |
| CN-110699670-B | Preparation method of vanadium dioxide film | 西安近代化学研究所 | 2021-11-23 | — | — | CN | claimed |
| CN-110699670-A | Preparation method of vanadium dioxide film | 西安近代化学研究所 | 2020-01-17 | — | — | CN | claimed |
| CN-110643973-A | NaV2O5Preparation method of crystal film | 西安近代化学研究所 | 2020-01-03 | — | — | CN | claimed |
| CN-116410354-A | Supported multi-center catalyst and preparation method thereof | 中国石油天然气股份有限公司 | 2023-07-11 | — | — | CN | disclosed |
| CN-116410366-A | Polyethylene and preparation method thereof | 中国石油天然气股份有限公司 | 2023-07-11 | — | — | CN | disclosed |
| EP-2876671-B1 | COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, PHOTOVOLTAIC CELL ELEMENT, AND PHOTOVOLTAIC CELL | HITACHI CHEMICAL CO LTD (JP) | 2017-11-22 | — | — | EP | disclosed |
| US-9714262-B2 | Composition for forming passivation layer, semiconductor substrate having passivation layer, method of producing semiconductor substrate having passivation layer, photovoltaic cell element, method of producing photovoltaic cell element and photovoltaic cell | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2017-07-25 | — | — | US | disclosed |
| US-20160211389-A1 | COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, PHOTOV OLTAIC CELL ELEMENT, METHOD OF PRODUCING PHOTOVOLTAIC CELL ELEMENT, AND PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2016-07-21 | — | — | US | disclosed |
| US-20150228812-A1 | COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, PHOTOLOLTAIC CELL ELEMENT, METHOD OF PRODUCING PHOTOVOLTAIC CELL ELEMENT, AND PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2015-08-13 | — | — | US | disclosed |
| US-20150166582-A1 | COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, PHOTOVOLTAIC CELL ELEMENT, METHOD OF PRODUCING PHOTOVOLTAIC CELL ELEMENT AND PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. a corporation | 2015-06-18 | — | — | US | disclosed |
| EP-2876670-A1 | COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, SOLAR CELL ELEMENT, PRODUCTION METHOD FOR SOLAR CELL ELEMENT, AND SOLAR CELL | Hitachi Chemical Co., Ltd. (JP) | 2015-05-27 | — | — | EP | disclosed |
| EP-2876671-A1 | COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE WITH PASSIVATION LAYER, METHOD FOR PRODUCING SAID SEMICONDUCTOR SUBSTRATE, SOLAR CELL ELEMENT, AND METHOD FOR PRODUCING SAME | Hitachi Chemical Company, Ltd. (JP) | 2015-05-27 | — | — | EP | disclosed |
| US-6246505-B1 | Photochromic devices | DONNELLY CORPORATION | 2001-06-12 | — | — | US | disclosed |
| EP-0871924-A4 | NOVEL PHOTOCHROMIC DEVICES | DONNELLY CORP (US) | 2000-03-29 | — | — | EP | disclosed |
| US-5838483-A | Photochromic devices | DONNELLY CORPORATION (US) | 1998-11-17 | — | — | US | disclosed |
| EP-0871924-A1 | NOVEL PHOTOCHROMIC DEVICES | DONNELLY CORPORATION (US) | 1998-10-21 | — | — | EP | disclosed |
| US-5604626-A | Photochromic devices | DONNELLY CORPORATION (US) | 1997-02-18 | — | — | US | disclosed |
| WO-1996024882-A1 | NOVEL PHOTOCHROMIC DEVICES | DONNELLY CORPORATION (US) | 1996-08-15 | — | — | WO | disclosed |
| US-5215943-A | Ceramic membranes with enhanced thermal stability | WISCONSIN ALUMI RESEARCH FOUNDATION (US) | 1993-06-01 | — | — | US | disclosed |