SCHEMBL7976916

SCHEMBL7976916

O=C1NCCCN1CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8732854 0.93 SMN1; SMN2 (0.43)
SCHEMBL634568 0.86
SCHEMBL1446505 0.83 SMN1; SMN2 (0.46)
SCHEMBL1446210 0.79 SMN1; SMN2 (0.44)
SCHEMBL17599185 0.78 SMN1; SMN2 (0.42)
SCHEMBL20733275 0.77 SMN1; SMN2 (0.49)
SCHEMBL22559978 0.77
SCHEMBL22662833 0.77 SMN1; SMN2 (0.53)
SCHEMBL1446059 0.77
SCHEMBL17599205 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118647378-A Inhibitors of Mei Nen protein interaction with MLL 巴拉疗法公司 2024-09-13 CN disclosed
EP-2998327-B1 POLYOLEFIN MODIFIED WITH NITROGEN-CONTAINING HETEROCYCLIC COMPOUND, AND ADHESIVE COMPOSITION CONTAINING SAME TOYO BOSEKI (JP) 2022-03-23 EP disclosed
CN-105229041-B Nitrogen-containing heterocycle compound improved polyalkene and adhesive composition containing it 东洋纺株式会社 2019-04-19 CN disclosed
US-10253114-B2 Polyolefin modified with nitrogen-containing heterocyclic compound, and adhesive composition containing same TOYOBO CO., LTD. (JP) 2019-04-09 US disclosed
US-20160130373-A1 POLYOLEFIN MODIFIED WITH NITROGEN-CONTAINING HETEROCYCLIC COMPOUND, AND ADHESIVE COMPOSITION CONTAINING SAME TOYOBO CO., LTD. (JP) 2016-05-12 US disclosed
EP-2998327-A1 POLYOLEFIN MODIFIED WITH NITROGEN-CONTAINING HETEROCYCLIC COMPOUND, AND ADHESIVE COMPOSITION CONTAINING SAME TOYOBO CO., LTD. (JP) 2016-03-23 EP disclosed
US-6287746-B1 PHOTOACID GENERATOR NEC CORPORATION (JP) 2001-09-11 US disclosed
EP-0483693-B1 Photosensitive colored resin composition, colored image formation method of color filter, and formation method of black matrix TOYO GOSEI KOGYO KK (JP) 1998-12-30 EP disclosed
US-5639579-A SOLID STATE CAMERAS, LIQUID CRYSTAL DISPLAYS TOYO GOSEI KOGYO CO., LTD. (JP) 1997-06-17 US disclosed
US-5147553-A Separation of fluid mixture IONICS, INCORPORATED (US) 1992-09-15 US disclosed
EP-0483693-A2 Photosensitive colored resin composition, colored image formation method of color filter, and formation method of black matrix TOYO GOSEI KOGYO CO., LTD. (JP) 1992-05-06 EP disclosed