SCHEMBL7977882

SCHEMBL7977882

FC[CH]Br

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL910027 0.67
SCHEMBL10304149 0.60
SCHEMBL2477369 0.59
SCHEMBL38028 0.59
SCHEMBL499144 0.59
SCHEMBL16732706 0.59
SCHEMBL39713 0.59
SCHEMBL6852810 0.59
SCHEMBL127076 0.56
SCHEMBL6883549 0.56

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240105466-A1 METHOD FOR FORMING PATTERN OF METAL OXIDE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT RESONAC CORPORATION (JP) 2024-03-28 US claimed
US-20240038546-A1 PLASMA ETCHING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT SHOWA DENKO K.K. (JP) 2024-02-01 US claimed
WO-2001047917-A1 SUBSTITUTED THIENYLALKYLAMINO-1,3,5-TRIAZINES FOR USE AS HERBICIDES BAYER AKTIENGESELLSCHAFT (DE) 2001-07-05 WO claimed
CN-116744926-A Compounds as inhibitors of casein kinase 北京原基华毅生物科技有限公司 2023-09-12 CN disclosed
EP-2844660-B1 TRIAZOLOPYRIDAZINE COMPOUNDS, USE AS INHIBITORS OF THE KINASE LRRK2, AND METHODS FOR PREPARATION THEREOF SOUTHERN RES INST (US) 2017-11-01 EP disclosed
US-9261780-B2 Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound JSR CORPORATION (JP) 2016-02-16 US disclosed
WO-2015184222-A1 INHIBITORS OF HEPATOCYTE GROWTH FACTOR [HGF] AND MACROPHAGE STIMULATING PROTEIN [MSP] MATURATION SOUTHERN RESEARCH INSTITUTE (US) 2015-12-03 WO disclosed
US-9040221-B2 Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound JSR CORPORATION (JP) 2015-05-26 US disclosed
EP-2844660-A1 TRIAZOLOPYRIDAZINE COMPOUNDS, USE AS INHIBITORS OF THE KINASE LRRK2, AND METHODS FOR PREPARATION THEREOF Southern Research Institute (US) 2015-03-11 EP disclosed
US-20140004463-A9 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND JSR CORPORATION (JP) 2014-01-02 US disclosed
WO-2013166276-A1 TRIAZOLOPYRIDAZINE COMPOUNDS, USE AS INHIBITORS OF THE KINASE LRRK2, AND METHODS FOR PREPARATION THEREOF SOUTHERN RESEARCH INSTITUTE (US) 2013-11-07 WO disclosed
US-20130143160-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND JSR CORPORATION (JP) 2013-06-06 US disclosed
US-20130122426-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND JSR CORPORATION (JP) 2013-05-16 US disclosed
CN-102119143-A Amide derivative, pest control agent containing the same, and method of using the pest control agent MITSUI CHEMICALS AGRO INC 2011-07-06 CN disclosed
US-5744678-A NICKEL COMPOUND, ORGANOPHOSPHORUS COMPOUND, ORGANOALUMINUM COMPOUND, CARBON-HALOGEN COMPOUNDS; CATALYST SELECTIVITY NIPPON OIL CO., LTD. (JP) 1998-04-28 US disclosed
US-5728641-A Catalyst component for the polymerization of olefins NIPPON OIL COMPANY, LIMITED (JP) 1998-03-17 US disclosed
EP-0758563-A1 OLEFIN OLIGOMERIZATION CATALYST AND PROCESS FOR THE PREPARATION OF OLEFIN OLIGOMER USING IT NIPPON OIL COMPANY, LTD. (JP) 1997-02-19 EP disclosed
US-5556821-A Catalyst component for the polymerization of olefins NIPPON OIL COMPANY, LIMITED (JP) 1996-09-17 US disclosed
EP-0587440-A2 Catalyst component for the polymerisation of olefins and process for preparing olefin polymers using same NIPPON OIL COMPANY, LIMITED (JP) 1994-03-16 EP disclosed