⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL83145 | 0.83 | — | — | |
| SCHEMBL726269 | 0.79 | — | — | |
| SCHEMBL22385135 | 0.79 | — | — | |
| SCHEMBL22821854 | 0.78 | — | — | |
| SCHEMBL27647765 | 0.77 | — | — | |
| SCHEMBL18381738 | 0.75 | — | — | |
| SCHEMBL799233 | 0.75 | — | — | |
| SCHEMBL24379479 | 0.73 | — | — | |
| SCHEMBL21157337 | 0.73 | — | — | |
| SCHEMBL23544634 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106795071-A | Method for preparing branched fluoroalkyl alkene | 科慕埃弗西有限公司 | 2017-05-31 | — | — | CN | claimed |
| CN-105593948-B | Device for generating, distributing and/or using electric energy and component for such a device | ABB瑞士股份有限公司 | 2019-07-19 | — | — | CN | disclosed |
| CN-106795071-A | Method for preparing branched fluoroalkyl alkene | 科慕埃弗西有限公司 | 2017-05-31 | — | — | CN | disclosed |
| CN-101983417-B | Plasma etching method | ZEON CORP | 2013-04-24 | — | — | CN | disclosed |
| US-8318656-B2 | Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foam stabilizers | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2012-11-27 | — | — | US | disclosed |
| US-20120071689-A1 | PRODUCTION PROCESSES AND SYSTEMS, COMPOSITIONS, SURFACTANTS, MONOMER UNITS, METAL COMPLEXES, PHOSPHATE ESTERS, GLYCOLS, AQUEOUS FILM FORMING FOAMS, AND FOAM STABILIZERS | E.I. DU PONT DE NEMOURS AND COMPANY CHEMTURA CORPORATION (US) | 2012-03-22 | — | — | US | disclosed |
| US-7943567-B2 | Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foam stabilizers | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-05-17 | — | — | US | disclosed |
| US-20110068086-A1 | PLASMA ETCHING METHOD | ZEON CORPORATION (JP) | 2011-03-24 | — | — | US | disclosed |
| CN-101983417-A | Plasma etching method | ZEON CORP | 2011-03-02 | — | — | CN | disclosed |
| US-20070282115-A1 | Production Processes and Systems, Compositions, Surfactants, Monomer Units, Metal Complexes, Phosphate Esters, Glycols, Aqueous Film Foams, and Foam Stabilizers | E. I. DU PONT DE NEMOURS AND COMPANY | 2007-12-06 | — | — | US | disclosed |