⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8137652 | 0.75 | — | — | |
| SCHEMBL11694013 | 0.73 | — | — | |
| SCHEMBL4823585 | 0.73 | — | — | |
| SCHEMBL197896 | 0.73 | — | — | |
| SCHEMBL1963590 | 0.71 | TET2 (0.38) | — | |
| SCHEMBL2138939 | 0.71 | TET2 (0.38) | — | |
| SCHEMBL15074902 | 0.71 | — | — | |
| SCHEMBL18391348 | 0.71 | TSHR (0.33) | — | |
| SCHEMBL3391288 | 0.71 | — | — | |
| SCHEMBL11922091 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8859194-B2 | Polymer compound, and resist-protecting film composition including same for a liquid immersion exposure process | DONGJIN SEMICHEM CO., LTD. (KR) | 2014-10-14 | — | — | US | disclosed |
| WO-2014105926-A1 | NOVEL BETULINIC ACID PROLINE DERIVATIVES AS HIV INHIBITORS | HETERO RESEARCH FOUNDATION (IN) | 2014-07-03 | — | — | WO | disclosed |
| US-8546062-B2 | Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-01 | — | — | US | disclosed |
| US-20130252170-A1 | Polymer Compound, And Resist-Protecting Film Composition Including Same For A Liquid Immersion Exposure Process | DONGJIN SEMICHEM CO., LTD. (KR) | 2013-09-26 | — | — | US | disclosed |
| WO-2013047092-A1 | PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-04-04 | — | — | WO | disclosed |
| US-8309505-B2 | Hand dish composition in the form of an article | THE PROCTER & GAMBLE COMPANY (US) | 2012-11-13 | — | — | US | disclosed |
| US-20120070782-A1 | SELF-FORMING TOP ANTI-REFLECTIVE COATING COMPOSITIONS AND, PHOTORESIST MIXTURES AND METHOD OF IMAGING USING SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-22 | — | — | US | disclosed |
| EP-2032715-B1 | Methods and materials for making simvastatin and related compounds | UNIV CALIFORNIA (US) | 2012-02-01 | — | — | EP | disclosed |
| US-20110028373-A1 | HAND DISH COMPOSITION IN THE FORM OF AN ARTICLE | THE PROCTER & GAMBLE COMPANY | 2011-02-03 | — | — | US | disclosed |
| WO-2010067905-A2 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-06-17 | — | — | WO | disclosed |
| US-7678537-B2 | Graded topcoat materials for immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-03-16 | — | — | US | disclosed |
| US-20080311506-A1 | GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY | ALLEN ROBERT D | 2008-12-18 | — | — | US | disclosed |
| US-20080311530-A1 | GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2008-12-18 | — | — | US | disclosed |