SCHEMBL8005594

SCHEMBL8005594

CC1=CC(=[N+]=[N-])C=CC1N(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11129424 0.67
Hydrochloric Acid SCHEMBL6015210 0.65
SCHEMBL9725572 0.60
Sulfuric Acid SCHEMBL9725599 0.60
SCHEMBL9550891 0.60
SCHEMBL7574392 0.60
SCHEMBL4941395 0.57
SCHEMBL9247504 0.56
SCHEMBL8370302 0.49
SCHEMBL28925615 0.46

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5407777-A Diazo-type recording material comprising a 1-phenyl-3-pyrazolidone(phenidone) as an anti-oxidant FUJI PHOTO FILM CO., LTD. (JP) 1995-04-18 US claimed
US-4486527-A HEAT-FUSIBLE COLOR ASSISTANT RICOH COMPANY, LTD. (JP) 1984-12-04 US claimed
US-10415011-B2 Adherend recovery method, adherend recovery apparatus, gas-generating film and resin composition JSR CORPORATION (JP) 2019-09-17 US disclosed
EP-3040411-B1 ADHEREND RECOVERY METHOD AND ADHEREND RECOVERY DEVICE JSR CORP (JP) 2019-07-03 EP disclosed
EP-3040411-A1 ADHEREND RECOVERY METHOD, ADHEREND RECOVERY DEVICE, GAS GENERATION MEMBRANE, AND RESIN COMPOSITION JSR Corporation (JP) 2016-07-06 EP disclosed
US-20160168532-A1 ADHEREND RECOVERY METHOD, ADHEREND RECOVERY APPARATUS, GAS-GENERATING FILM AND RESIN COMPOSITION JSR CORPORATION (JP) 2016-06-16 US disclosed
US-6077642-A SUBSTRATE WITH HEAT SENSITIVE RECORDING LAYER FUJI PHOTO FILM CO., LTD. (JP) 2000-06-20 US disclosed
EP-0803377-B1 Recording material FUJI PHOTO FILM CO LTD (JP) 1999-11-24 EP disclosed
US-5977019-A MULTILAYER; HEAT SENSITIVE RECORDING LAYERS ON SUPPORT; RESIN LAYER ON PAPER FUJI PHOTO FILM CO., LTD. (JP) 1999-11-02 US disclosed
US-5945247-A Heat development duplicating material comprising ascorbic acid FUJI PHOTO FILM CO., LTD. (JP) 1999-08-31 US disclosed
US-5935757-A HIGH COLOR DEVELOPING SENSITIVITY AND EXCELLENT STORABILITY. USING AN ESTER- OR AMIDE CONTAINING SULFOAMIDOBENZENE IN A LAYER CONTAINING A DIAZONIUM SALT AND A REACTIVE COUPLER FUJI PHOTO FILM CO., LTD. (JP) 1999-08-10 US disclosed
US-4650740-A DIAZONIUM SALT AND COUPLER FUJI PHOTO FILM CO., LTD. (JP) 1987-03-17 US disclosed
US-4644376-A Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 1987-02-17 US disclosed
US-4598035-A LEUCO AND DISAZO DYES FUJI PHOTO FILM CO., LTD. (JP) 1986-07-01 US disclosed
US-4529681-A Microcapsules containing vinyl compound, photoinitiator and color forming compound FUJI PHOTO FILM CO., LTD. (JP) 1985-07-16 US disclosed
US-4497887-A Thermal development type diazo copying material with hydrophobic resin encapsulated coupler particle Ricoh Compay, Ltd. (JP) 1985-02-05 US disclosed
US-4486527-A HEAT-FUSIBLE COLOR ASSISTANT RICOH COMPANY, LTD. (JP) 1984-12-04 US disclosed
US-4467024-A Process for the production of thermo-developable type diazo copying material RICOH CO., LTD. (JP) 1984-08-21 US disclosed
US-4416967-A SUBSTRATE, PRECOAT LAYER OF SILICA AND COPOLYMER OF ACRYLIC, OXY, RICOH CO., LTD. (JP) 1983-11-22 US disclosed
US-4400456-A FATTY ACID AMIDE COLOR ASSIST, HIGH DENSITY IMAGES RICOH CO., LTD. (JP) 1983-08-23 US disclosed