Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 2/20 | 0.70 |
| ▸ | ESR1 | P03372 | 2/20 | 0.56 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.56 |
| ▸ | POLB | P06746 | 1/20 | 0.56 |
| ▸ | MEN1 | O00255 | 1/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.50 |
| ▸ | CA12 | O43570 | 2/20 | 0.48 |
| ▸ | CA2 | P00918 | 2/20 | 0.48 |
| ▸ | CA9 | Q16790 | 2/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.48 |
| ▸ | LMNA | P02545 | 2/20 | 0.48 |
| ▸ | CA5A | P35218 | 1/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.48 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.48 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.48 |
| ▸ | CA1 | P00915 | 1/20 | 0.45 |
| ▸ | CA6 | P23280 | 1/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | PARP1 | P09874 | 1/20 | 0.43 |
| ▸ | APP | P05067 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5169504 | 0.88 | CYP3A4 (0.67) | CYP3A4ESR1ESR2POLBMEN1 | |
| Resorcinol SCHEMBL5710714 | 0.87 | CYP3A4 (0.55) | CYP3A4ESR1ESR2POLBMEN1 | |
| SCHEMBL14399796 | 0.86 | CYP3A4 (0.54) | CYP3A4ESR1ESR2POLBMEN1 | |
| SCHEMBL6392035 | 0.85 | CYP3A4 (0.62) | CYP3A4ESR1ESR2POLBMEN1 | |
| SCHEMBL258585 | 0.84 | CYP3A4 (0.74) | CYP3A4ESR1ESR2POLBMEN1 | |
| SCHEMBL31281184 | 0.84 | CYP3A4 (0.74) | CYP3A4ESR1ESR2POLBMEN1 | |
| SCHEMBL9410965 | 0.83 | CYP3A4 (0.61) | CYP3A4ESR1ESR2POLBMEN1 | |
| SCHEMBL8157267 | 0.83 | CYP3A4 (0.71) | CYP3A4ESR1ESR2POLBMEN1 | |
| Bicarbonate SCHEMBL20494761 | 0.83 | CYP3A4 (0.71) | CYP3A4ESR1ESR2POLBMEN1 | |
| SCHEMBL689425 | 0.83 | CYP3A4 (0.66) | CYP3A4ESR1ESR2POLBMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9465142-B2 | Near-infrared absorptive composition, near-infrared cut filter using near-infrared absorptive composition, method for manufacturing near-infrared cut filter, and camera module and method for manufacturing camera module | FUJIFILM CORPORATION (JP) | 2016-10-11 | — | — | US | disclosed |
| US-9389507-B2 | Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition | FUJIFILM CORPORATION (JP) | 2016-07-12 | — | — | US | disclosed |
| US-9177921-B2 | Manufacturing method of semiconductor device | FUJIFILM CORPORATION (JP) | 2015-11-03 | — | — | US | disclosed |
| US-20150130008-A1 | NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE | FUJIFILM CORPORATION (JP) | 2015-05-14 | — | — | US | disclosed |
| US-20150124152-A1 | NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE | FUJIFILM CORPORATION (JP) | 2015-05-07 | — | — | US | disclosed |
| US-20140322893-A1 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2014-10-30 | — | — | US | disclosed |
| US-20140318697-A1 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2014-10-30 | — | — | US | disclosed |
| US-20140255846-A1 | POLYMERIZABLE COMPOSITION, AND PHOTOSENSITIVE LAYER, PERMANENT PATTERN, WAFER-LEVEL LENS, SOLID-STATE IMAGING DEVICE AND PATTERN FORMING METHOD EACH USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2014-09-11 | — | — | US | disclosed |
| US-8802355-B2 | Lithographic printing plate precursor and plate making method thereof | FUJIFILM CORPORATION (JP) | 2014-08-12 | — | — | US | disclosed |
| US-8766388-B2 | Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition | FUJIFILM CORPORATION (JP) | 2014-07-01 | — | — | US | disclosed |
| US-20100080926-A1 | INK COMPOSITION AND INKJET RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | US | disclosed |
| US-7531288-B2 | Negative-working excellent in preservation stability and exhibits high sensitivity and good printing durability; hydrophilic support; and a photosensitive layer containing a polymerization initiator, a chain transfer agent, a compound having an ethylenically unsaturated double bond and a polymer binder | FUJIFILM CORPORATION (JP) | 2009-05-12 | — | — | US | disclosed |
| US-20090087790-A1 | METHOD OF PRODUCING A NEGATIVE PLANOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| US-7455954-B2 | Lithographic printing plate precursor and polymerizable composition | FUJIFILM CORPORATION (JP) | 2008-11-25 | — | — | US | disclosed |
| US-7449282-B2 | Lithographic printing plate precursor | FUJIFILM CORPORATION (JP) | 2008-11-11 | — | — | US | disclosed |
| US-20080213550-A1 | INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATERIAL, METHOD FOR PRODUCING PLANOGRAPHIC PRINTING PLATE, AND PLANOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2008-09-04 | — | — | US | disclosed |
| US-7368544-B2 | Polymerizable composition and planographic printing plate precursor using the same | FUJIFILM CORPORATION (JP) | 2008-05-06 | — | — | US | disclosed |
| US-7314698-B2 | Polymerizable composition and planographic printing plate precursor using the same | FUJIFILM CORPORATION (JP) | 2008-01-01 | — | — | US | disclosed |
| US-7279515-B2 | Resorcinol carbonate-based phosphate ester compounds as flame retardants | INDSPEC CHEMICAL CORPORATION | 2007-10-09 | — | — | US | disclosed |
| US-7279515-B2 | Resorcinol carbonate-based phosphate ester compounds as flame retardants | INDSPEC CHEMICAL CORPORATION | 2007-10-09 | — | — | US | disclosed |