SCHEMBL8024463

SCHEMBL8024463

CO[SiH](OC)OC.[SiH4]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29689437 1.00
Fluoride SCHEMBL28220692 0.95
SCHEMBL9788071 0.94
Ethylene SCHEMBL438201 0.91
SCHEMBL28246359 0.91
SCHEMBL3919064 0.89
Ethane SCHEMBL5052383 0.89
SCHEMBL4515432 0.89
Water SCHEMBL639453 0.89
Ammonia Solution, Strong SCHEMBL10633588 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118240492-A Insulating protective film for preventing electrolyte leakage and preparation method thereof 福建腾博新材料科技有限公司 2024-06-25 CN claimed
CN-106220891-A A kind of preparation method of the aluminum pigment with resin high-affinity 上海明园新材料科技有限公司 2016-12-14 CN claimed
CN-1124519-C Photomask blanks DU PONT (US) 2003-10-15 CN claimed
US-12522544-B2 Nanoporous structures and assemblies incorporating the same UNIVERSITY OF MASSACHUSETTS (US) 2026-01-13 US disclosed
US-12365701-B2 Silane compound containing perfluoropolyether group, preparation method therefor, surface treatment agent and product thereof Guangzhou Ur Materials Technology Co., Ltd. (CN) 2025-07-22 US disclosed
CN-119931019-A Silane compound containing linear perfluoropolyether group and preparation method thereof 东莞市信恩高分子材料有限公司 2025-05-06 CN disclosed
US-20240217886-A1 NANOPOROUS STRUCTURES AND ASSEMBLIES INCORPORATING THE SAME UNIVERSITY OF MASSACHUSETTS 2024-07-04 US disclosed
CN-118240492-A Insulating protective film for preventing electrolyte leakage and preparation method thereof 福建腾博新材料科技有限公司 2024-06-25 CN disclosed
CN-118240492-A Insulating protective film for preventing electrolyte leakage and preparation method thereof 福建腾博新材料科技有限公司 2024-06-25 CN disclosed
US-11964920-B2 Nanoporous structures and assemblies incorporating the same UNIVERSITY OF MASSACHUSETTS (US) 2024-04-23 US disclosed
CN-117384203-A Preparation method and application of vinyl trimethoxy silane coupling agent 湖北新蓝天新材料股份有限公司 2024-01-12 CN disclosed
CN-104968748-B Alkoxy-functional organopolysiloxane resins and polymer and its related forming method 道康宁公司 2017-03-29 CN disclosed
CN-106220891-A A kind of preparation method of the aluminum pigment with resin high-affinity 上海明园新材料科技有限公司 2016-12-14 CN disclosed
CN-105008432-A Moisture-curable hot melt silicone adhesive compositions including an alkoxy-functional siloxane reactive resin DOW CORNING 2015-10-28 CN disclosed
CN-104968748-A ALKOXY-FUNCTIONAL ORGANOPOLYSILOXANE RESIN AND POLYMER AND RELATED METHODS FOR FORMING SAME DOW CORNING 2015-10-07 CN disclosed
CN-101048704-B Resist composition DOW CORNING INC 2011-04-13 CN disclosed
CN-101400440-A Method for producing adsorbent-containing molded body and adsorbent-containing molded body KYODO PRINTING CO LTD (JP) 2009-04-01 CN disclosed
CN-101048704-A Resist composition DOW CORNING (US) 2007-10-03 CN disclosed
CN-1124519-C Photomask blanks DU PONT (US) 2003-10-15 CN disclosed
US-6096844-A COMPRISING A TITANIUM COMPOUND, A MAGNESIUM COMPOUND, AND A HALOGEN COMPOUND, AN ORGANOALUMINUM COMPOUND, AN ORGANOSILICON COMPOUND JAPAN POLYOLEFINS CO., LTD. (JP) 2000-08-01 US disclosed