⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8242069 | 0.70 | — | — | |
| SCHEMBL13094305 | 0.70 | — | — | |
| SCHEMBL14155062 | 0.70 | — | — | |
| SCHEMBL12955664 | 0.70 | — | — | |
| SCHEMBL12286686 | 0.70 | — | — | |
| SCHEMBL15382412 | 0.70 | — | — | |
| SCHEMBL13818519 | 0.69 | — | — | |
| SCHEMBL17715737 | 0.69 | — | — | |
| SCHEMBL30505250 | 0.67 | — | — | |
| SCHEMBL14186830 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9905414-B2 | Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2018-02-27 | — | — | US | disclosed |
| US-20160268121-A1 | VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2016-09-15 | — | — | US | disclosed |
| US-20160268121-A1 | VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2016-09-15 | — | — | US | disclosed |
| US-20160111276-A1 | VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2016-04-21 | — | — | US | disclosed |
| US-20160111276-A1 | VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2016-04-21 | — | — | US | disclosed |
| US-20160087066-A1 | VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2016-03-24 | — | — | US | disclosed |
| US-20160087066-A1 | VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2016-03-24 | — | — | US | disclosed |
| US-20150118395-A1 | Vapor Deposition of Metal Oxides, Silicates and Phosphates, and Silicon Dioxide | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2015-04-30 | — | — | US | disclosed |
| US-20150118395-A1 | Vapor Deposition of Metal Oxides, Silicates and Phosphates, and Silicon Dioxide | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2015-04-30 | — | — | US | disclosed |
| US-20150031884-A1 | ANTI-VIRAL COMPOUNDS | ABBVIE INC. (US) | 2015-01-29 | — | — | US | disclosed |
| US-8334016-B2 | Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2012-12-18 | — | — | US | disclosed |
| US-8334016-B2 | Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2012-12-18 | — | — | US | disclosed |
| US-20120028478-A1 | VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2012-02-02 | — | — | US | disclosed |
| US-20120028478-A1 | VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SILICON DIOXIDE | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2012-02-02 | — | — | US | disclosed |
| EP-2308875-A1 | Fused bicycloheterocycle substituted quinuclidine derivatives as .alpha.7 nAChR modulators | Abbott Laboratories (US) | 2011-04-13 | — | — | EP | disclosed |
| WO-2009094279-A1 | QUINOLIZIDINONE M1 RECEPTOR POSITIVE ALLOSTERIC MODULATORS | MERCK & CO., INC. (US) | 2009-07-30 | — | — | WO | disclosed |
| US-7507848-B2 | Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2009-03-24 | — | — | US | disclosed |
| US-7507848-B2 | Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2009-03-24 | — | — | US | disclosed |
| WO-2008137706-A1 | CARDANOL BASED DIMERS AND USES THEREFOR | CARDOLITE CORPORATION (US) | 2008-11-13 | — | — | WO | disclosed |
| EP-1772534-A2 | Tungsten-containing and hafnium-containing precursors for vapor deposition | The President and Fellows of Harvard College (US) | 2007-04-11 | — | — | EP | disclosed |