Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 1/20 | 0.43 |
| ▸ | KDM1A | O60341 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2761277 | 0.79 | ELANE (0.49) | ELANEKDM1A | |
| SCHEMBL17171699 | 0.79 | ELANE (0.44) | ELANEKDM1ACA2 | |
| SCHEMBL8028975 | 0.79 | ELANE (0.41) | ELANEKDM1A | |
| SCHEMBL17546512 | 0.78 | ELANE (0.43) | ELANEKDM1ACA2 | |
| SCHEMBL2223556 | 0.77 | ELANE (0.52) | ELANEKDM1ACA2 | |
| SCHEMBL12257146 | 0.76 | ELANE (0.42) | ELANEKDM1ACA2 | |
| SCHEMBL8038906 | 0.76 | ELANE (0.42) | ELANEKDM1ACA2 | |
| SCHEMBL21268207 | 0.76 | ELANE (0.53) | ELANEKDM1ACA2 | |
| SCHEMBL29442067 | 0.75 | ELANE (0.41) | ELANEKDM1ACA2 | |
| SCHEMBL6544693 | 0.74 | KDM4E (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0762207-B1 | Positive working photosensitive composition and method of producing relief structures | BASF AG (DE) | 2000-04-12 | — | — | EP | disclosed |
| US-5914219-A | Radiation-sensitive mixture and the production of relief structures having improved contrast | BASF AKTIENGESELLSCHAFT (DE) | 1999-06-22 | — | — | US | disclosed |
| US-5783354-A | QUATERNARY AMMONIUM COMPOUNDS | BASF AKTIENGESELLSCHAFT (DE) | 1998-07-21 | — | — | US | disclosed |
| EP-0616258-B1 | Radiation sensitive composition and process for forming relief structures with improved contrast | BASF AG (DE) | 1997-05-21 | — | — | EP | disclosed |
| EP-0762207-A2 | Positive working photosensitive composition and method of producing relief structures | BASF AKTIENGESELLSCHAFT (DE) | 1997-03-12 | — | — | EP | disclosed |
| EP-0616258-A1 | Radiation sensitive composition and process for forming relief structures with improved contrast | BASF Aktiengesellschaft (DE) | 1994-09-21 | — | — | EP | disclosed |
| US-5318876-A | Solutions of water insoluble, base soluble polymeric binder, substituted sulfonium salts, substituted benzenesulfonates, having tolerance for delay between exposure and heating to develop | BASF AKTIENGESELLSCHAFT (DE) | 1994-06-07 | — | — | US | disclosed |
| US-5300400-A | Process for the production of relief patterns and images utilizing an organic compound having at least one acid-cleavable group and a storage stability improving amount of a second organic compound | BASF AKTIENGESELLSCHAFT (DE) | 1994-04-05 | — | — | US | disclosed |
| US-5191124-A | Photoinitiators for Cationic Polymerization | BASF AKTIENGESELLSCHAFT (DE) | 1993-03-02 | — | — | US | disclosed |
| US-5084371-A | POSITIVE-WORKING, RADIATION-SENSITIVE MIXTURE BASED ON ACID-CLEAVABLE AND PHOTOCHEMICALLY ACID-FORMING COMPOUNDS, AND THE PRODUCTION OF RELIEF PATTERNS AND RELIEF IMAGES | BASF AKTIENGESELLSCHAFT (DE) | 1992-01-28 | — | — | US | disclosed |
| US-5069998-A | RADIATION SENSITIVE MIXTURE AND PRODUCTION OF RELIEF PATTERNS | BASF AKTIENGESELLSCHAFT (DE) | 1991-12-03 | — | — | US | disclosed |
| US-5064746-A | RADIATION-SENSITIVE MIXTURE FOR PHOTOSENSITIVE COATING MATERIALS AND THE PRODUCTION OF RELIEF PATTERNS AND RELIEF IMAGES | BASF AKTIENGESELLSCHAFT (DE) | 1991-11-12 | — | — | US | disclosed |
| US-4883740-A | RELIEF PATTERNS AND IMAGES | BASF AKTIENGESELLSCHAFT (DE) | 1989-11-28 | — | — | US | disclosed |