SCHEMBL80310

SCHEMBL80310

CNCCN.[Pd]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL164408 0.96
SCHEMBL28219582 0.92
Ethylenediamine SCHEMBL28130239 0.92
SCHEMBL28201960 0.92
Hydrochloric Acid SCHEMBL3318108 0.92
Ammonia Solution, Strong SCHEMBL27596989 0.92
Bromide SCHEMBL7118121 0.92
Hydrochloric Acid SCHEMBL7112970 0.92
SCHEMBL17473972 0.92
Hydrogen Sulfide SCHEMBL28079926 0.92

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 170 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107002242-B Plating bath composition and method for electroless palladium plating 埃托特克德国有限公司 2020-02-11 CN claimed
CN-107109653-B Plating bath composition and method for electroless palladium plating 埃托特克德国有限公司 2020-02-07 CN claimed
US-10385458-B2 Plating bath composition and method for electroless plating of palladium ATOTECH DEUTSCHLAND GMBH (DE) 2019-08-20 US claimed
US-20190093235-A1 PLATING BATH COMPOSITION AND METHOD FOR ELECTROLESS PLATING OF PALLADIUM ATOTECH DEUTSCHLAND GMBH & CO. KG (F/K/A ATOTECH DEUTSCHLAND GMBH) (DE) 2019-03-28 US claimed
EP-3234219-B1 PLATING BATH COMPOSITION AND METHOD FOR ELECTROLESS DEPOSITION OF PALLADIUM ATOTECH DEUTSCHLAND GMBH (DE) 2019-03-27 EP claimed
US-20170321327-A1 PLATING BATH COMPOSITION AND METHOD FOR ELECTROLESS PLATING OF PALLADIUM ATOTECH DEUTSCHLAND GMBH (DE) 2017-11-09 US claimed
EP-3234218-A2 PLATING BATH COMPOSITION AND METHOD FOR ELECTROLESS PLATING OF PALLADIUM ATOTECH Deutschland GmbH (DE) 2017-10-25 EP claimed
EP-3234219-A1 PLATING BATH COMPOSITION AND METHOD FOR ELECTROLESS PLATING OF PALLADIUM ATOTECH Deutschland GmbH (DE) 2017-10-25 EP claimed
CN-107109653-A Bath compositions and method for chemical palladium-plating 埃托特克德国有限公司 2017-08-29 CN claimed
CN-107002242-A Plating bath composition and method for electroless palladium plating 埃托特克德国有限公司 2017-08-01 CN claimed
US-11945882-B2 Method for producing antibody-drug conjugate DAIICHI SANKYO COMPANY, LIMITED (JP) 2024-04-02 US disclosed
US-11802135-B2 Lysophosphatidic acid derivative MITSUBISHI TANABE PHARMA CORPORATION (JP) 2023-10-31 US disclosed
US-20230146210-A1 NOVEL LYSOPHOSPHATIDIC ACID DERIVATIVE MITSUBISHI TANABE PHARMA CORPORATION (JP) 2023-05-11 US disclosed
US-11365192-B2 Pyridine compound substituted with azole TAISHO PHARMACEUTICAL CO., LTD. (JP) 2022-06-21 US disclosed
US-20220024921-A1 1,3,4-OXADIAZOLONE COMPOUND AND PHARMACEUTICAL NIPPON SHINYAKU CO., LTD. (JP) 2022-01-27 US disclosed
US-20090286980-A1 OPTICALLY ACTIVE 3-AMINO-2,5-DIOXOPYRROLIDINE-3-CARBOXYLATE, PROCESS FOR PRODUCTION OF THE COMPOUND, AND USE OF THE COMPOUND DAINIPPON SUMITOMO PHARMA CO., LTD. (JP) 2009-11-19 US disclosed
US-20090253917-A1 3-HYDRAZINO-2,5-DIOXOPYRROLIDINE-3-CARBOXYLATES, PROCESS FOR PRODUCTION OF THE SAME, AND USE OF THE SAME DAINIPPON SUMITOMO PHARMA CO., LTD. (JP) 2009-10-08 US disclosed
EP-2096106-A1 NOVEL POLYAMINE DERIVATIVES Nihon University (JP) 2009-09-02 EP disclosed
US-20090137530-A1 Amine Compound and Use Thereof for Medical Purposes MITSUBISHI TANABE PHARMA CORPORATION (JP) 2009-05-28 US disclosed
EP-1961734-A1 AMINE COMPOUND AND USE THEREOF FOR MEDICAL PURPOSES Mitsubishi Tanabe Pharma Corporation (JP) 2008-08-27 EP disclosed