SCHEMBL8045964

SCHEMBL8045964

CCCCCCCCCCCCCCCOCC[O]

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.56
THRB P10828 1/20 0.56
HTT P42858 1/20 0.56
KMT2A Q03164 1/20 0.56
MAPT P10636 1/20 0.56
CES2 O00748 2/20 0.52
TSHR P16473 2/20 0.44
ALDH1A1 P00352 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
USP2 O75604 1/20 0.43
CA1 P00915 6/20 0.43
CA2 P00918 6/20 0.43
CA9 Q16790 6/20 0.43
LPAR3 Q9UBY5 3/20 0.43
LPAR1 Q92633 2/20 0.43
LPAR2 Q9HBW0 2/20 0.43
CA12 O43570 2/20 0.43
CA3 P07451 2/20 0.43
CA4 P22748 2/20 0.43
CA6 P23280 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL287607 1.00 MEN1 (0.56) MEN1THRBHTTKMT2AMAPT
SCHEMBL4401470 1.00 MEN1 (0.56) MEN1THRBHTTKMT2AMAPT
SCHEMBL1402432 1.00 MEN1 (0.56) MEN1THRBHTTKMT2AMAPT
SCHEMBL1110920 1.00 MEN1 (0.56) MEN1THRBHTTKMT2AMAPT
SCHEMBL461073 1.00 MEN1 (0.56) MEN1THRBHTTKMT2AMAPT
SCHEMBL7421467 1.00 MEN1 (0.56) MEN1THRBHTTKMT2AMAPT
SCHEMBL1111117 1.00 MEN1 (0.56) MEN1THRBHTTKMT2AMAPT
SCHEMBL2948467 1.00 MEN1 (0.56) MEN1THRBHTTKMT2AMAPT
SCHEMBL18044439 1.00 MEN1 (0.56) MEN1THRBHTTKMT2AMAPT
SCHEMBL49203 1.00 MEN1 (0.56) MEN1THRBHTTKMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6106999-A SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS MITSUI CHEMICALS (JP) 2000-08-22 US disclosed