SCHEMBL8047267

SCHEMBL8047267

CC(C)COc1ccc(C(C)[O])cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACACB O00763 6/20 0.50
MAPT P10636 6/20 0.50
GPR88 Q9GZN0 1/20 0.46
HPGD P15428 3/20 0.45
POLB P06746 2/20 0.45
XBP1 P17861 1/20 0.45
KDM4E B2RXH2 2/20 0.44
ALDH1A1 P00352 2/20 0.44
CYP2C9 P11712 1/20 0.44
CYP2C19 P33261 1/20 0.44
NPC1 O15118 4/20 0.42
RAB9A P51151 2/20 0.42
LMNA P02545 1/20 0.42
TSHR P16473 1/20 0.42
HSD17B10 Q99714 1/20 0.42
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
NR1H4 Q96RI1 2/20 0.42
ALOX12 P18054 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL123415 0.84 MAPT (0.55) ACACBMAPTHPGDPOLBXBP1
SCHEMBL9906017 0.83 KMT2A (0.50) ACACBMAPTGPR88HPGDPOLB
SCHEMBL8036452 0.81 NQO1 (0.61) ACACBHPGDLMNATSHR
SCHEMBL18888181 0.79 ACACB (0.46) ACACBMAPTGPR88HPGDPOLB
SCHEMBL20969625 0.79 MAPT (0.46) ACACBMAPTGPR88HPGDPOLB
SCHEMBL24974017 0.79 MAPT (0.46) ACACBMAPTGPR88HPGDPOLB
SCHEMBL14831640 0.79 MAPT (0.46) ACACBMAPTGPR88HPGDPOLB
SCHEMBL24974023 0.79 MAPT (0.46) ACACBMAPTGPR88HPGDPOLB
SCHEMBL4400577 0.78 MAPT (0.47) ACACBMAPTHPGDPOLBXBP1
SCHEMBL940075 0.78 MAPT (0.54) MAPTHPGDPOLBXBP1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6106999-A SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS MITSUI CHEMICALS (JP) 2000-08-22 US disclosed