SCHEMBL8058547

SCHEMBL8058547

CC(C=O)CS(C)(=O)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12216608 0.76
SCHEMBL11505096 0.76
SCHEMBL12216579 0.76
SCHEMBL8737386 0.74
SCHEMBL8737383 0.74 SLC22A6 (0.36)
SCHEMBL18155442 0.74
SCHEMBL12181940 0.70
2-Methylbutanal SCHEMBL43412 0.69
2-Methylbutanal SCHEMBL3485198 0.69
2-Methylbutanal SCHEMBL933421 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170298291-A1 Phenyl Based Compounds Substituted with Aldehyde Moieties and their Use in Perfumery GIVAUDAN S.A. (CH) 2017-10-19 US disclosed
EP-0749044-B1 Positive-working photoresist composition TOKYO OHKA KOGYO CO LTD (JP) 2000-09-06 EP disclosed
EP-0749046-B1 Positive-working photoresist composition TOKYO OHKA KOGYO CO LTD (JP) 2000-05-10 EP disclosed
EP-0749044-A2 Positive-working photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1996-12-18 EP disclosed
EP-0749046-A1 Positive-working photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1996-12-18 EP disclosed