⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14219148 | 0.94 | PRSS1 (0.32) | — | |
| SCHEMBL2351624 | 0.94 | PRSS1 (0.32) | — | |
| SCHEMBL13783610 | 0.94 | PRSS1 (0.32) | — | |
| SCHEMBL11240661 | 0.94 | PRSS1 (0.32) | — | |
| SCHEMBL16221630 | 0.94 | PRSS1 (0.32) | — | |
| SCHEMBL16221696 | 0.91 | KMT2A (0.33) | — | |
| SCHEMBL8083570 | 0.91 | KMT2A (0.33) | — | |
| SCHEMBL11351258 | 0.91 | KMT2A (0.33) | — | |
| SCHEMBL7595334 | 0.88 | PRSS1 (0.34) | — | |
| SCHEMBL3458350 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 178 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240210830-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20230250238-A9 | SILICON-CONTAINING COMPOSITION AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE | JSR CORPORATION (JP) | 2023-08-10 | — | — | US | disclosed |
| US-11687000-B2 | Sulfonium compound, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-27 | — | — | US | disclosed |
| US-20230093664-A1 | SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | JSR CORPORATION (JP) | 2023-03-23 | — | — | US | disclosed |
| US-20220403116-A1 | SILICON-CONTAINING COMPOSITION AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE | JSR CORPORATION (JP) | 2022-12-22 | — | — | US | disclosed |
| US-10246605-B2 | Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit, and process for producing device | FUJIFILM CORPORATION (JP) | 2019-04-02 | — | — | US | disclosed |
| US-9996002-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-06-12 | — | — | US | disclosed |
| US-9996002-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-06-12 | — | — | US | disclosed |
| US-9989847-B2 | Onium salt compound, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-05 | — | — | US | disclosed |
| US-20180099928-A1 | SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-04-12 | — | — | US | disclosed |
| US-20120009529-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20120009529-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20100055621-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-04 | — | — | US | disclosed |
| US-20100055621-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-04 | — | — | US | disclosed |
| EP-0846679-B1 | Process for preparing 1,3-disubstituted urea | SUMIKA FINE CHEMICALS CO LTD (JP) | 2000-09-06 | — | — | EP | disclosed |
| US-5902899-A | Process for preparing 1, 3-disubstituted urea | SUMIKA FINE CHEMICALS CO., LTD. (JP) | 1999-05-11 | — | — | US | disclosed |
| EP-0846679-A2 | Process for preparing 1,3-disubstituted urea | SUMIKA FINE CHEMICALS Co., Ltd. (JP) | 1998-06-10 | — | — | EP | disclosed |
| EP-0002526-B1 | PROCESS FOR SIMULTANEOUSLY PREPARING 1,3-SUBSTITUTED UREAS AND 1,2-DIOLS | BASF Aktiengesellschaft (DE) | 1981-09-02 | — | — | EP | disclosed |
| US-4175137-A | Etherified cycloalkanols | CIBA-GEIGY CORPORATION (US) | 1979-11-20 | — | — | US | disclosed |
| EP-0002526-A1 | Process for simultaneously preparing 1,3-substituted ureas and 1,2-diols | BASF Aktiengesellschaft (DE) | 1979-06-27 | — | — | EP | disclosed |