⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16746505 | 1.00 | — | — | |
| SCHEMBL15161755 | 1.00 | — | — | |
| SCHEMBL16382614 | 1.00 | — | — | |
| SCHEMBL11579758 | 1.00 | — | — | |
| SCHEMBL14664501 | 1.00 | — | — | |
| SCHEMBL15161716 | 1.00 | — | — | |
| SCHEMBL1700115 | 1.00 | — | — | |
| SCHEMBL18472640 | 1.00 | — | — | |
| SCHEMBL8006136 | 1.00 | — | — | |
| SCHEMBL8005708 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0243006-B1 | BLOCK-GRAFT COPOLYMERS AND PROCESS FOR PRODUCING THE SAME | Shin-Etsu Chemical Co., Ltd. (JP) | 1992-12-23 | — | — | EP | claimed |
| EP-0243006-A2 | Block-graft copolymers and process for producing the same | Shin-Etsu Chemical Co., Ltd. (JP) | 1987-10-28 | — | — | EP | claimed |
| US-20260132295-A1 | COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, METHOD FOR MANUFACTURING ARTICLE, AND ARTICLE | AGC Inc. (JP) | 2026-05-14 | — | — | US | disclosed |
| WO-2025013913-A1 | COMPOUND, COMPOSITION, SURFACE TREATMENT AGENT, METHOD FOR PRODUCING ARTICLE, AND ARTICLE | ＡＧＣ株式会社 | 2025-01-16 | — | — | WO | disclosed |
| EP-4006081-A1 | DIELECTRIC PROPERTY-LOWERING AGENT, LOW-DIELECTRIC RESIN COMPOSITION CONTAINING SAME AND METHOD FOR LOWERING DIELECTRIC PROPERTIES OF RESIN | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-06-01 | — | — | EP | disclosed |
| US-20220162396-A1 | DIELECTRIC PROPERTY-LOWERING AGENT, LOW-DIELECTRIC RESIN COMPOSITION CONTAINING SAME AND METHOD FOR LOWERING DIELECTRIC PROPERTIES OF RESIN | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-05-26 | — | — | US | disclosed |
| US-20220073812-A1 | DILUTED MICROEMULSIONS WITH LOW SURFACE TENSIONS | FLOTEK CHEMISTRY, LLC (US) | 2022-03-10 | — | — | US | disclosed |
| US-11180690-B2 | Diluted microemulsions with low surface tensions | FLOTEK CHEMISTRY, LLC (US) | 2021-11-23 | — | — | US | disclosed |
| US-20210179924-A1 | COMPOSITIONS COMPRISING NON-HALOGENATED SOLVENTS FOR USE IN OIL AND/OR GAS WELLS AND RELATED METHODS | FLOTEK CHEMISTRY, LLC (US) | 2021-06-17 | — | — | US | disclosed |
| US-10934472-B2 | Compositions comprising non-halogenated solvents for use in oil and/or gas wells and related methods | FLOTEK CHEMISTRY, LLC (US) | 2021-03-02 | — | — | US | disclosed |
| EP-3629728-A2 | MICROEMULSIONS FOR AGRICULTURAL USE | Flotek Chemistry, LLC (US) | 2020-04-08 | — | — | EP | disclosed |
| EP-0657486-B1 | Fluorine-modified silicone, process for preparing the same, and cosmetics containing the same | KAO CORP (JP) | 1998-08-26 | — | — | EP | disclosed |
| US-5700898-A | EXCELLENT WATER AND OIL REPELLENCY | KAO CORPORATION (JP) | 1997-12-23 | — | — | US | disclosed |
| US-5548054-A | EXCELLENT WATER AND OIL REPELLENCY | KAO CORPORATION (JP) | 1996-08-20 | — | — | US | disclosed |
| US-5463009-A | Water- and oil-repellency; long wearing | KAO CORPORATION (JP) | 1995-10-31 | — | — | US | disclosed |
| EP-0657486-A2 | Fluorine-modified silicone, process for preparing the same, and cosmetics containing the same | Kao Corporation (JP) | 1995-06-14 | — | — | EP | disclosed |
| EP-0640644-A1 | FLUORINE-MODIFIED SILICONE DERIVATIVE, PRODUCTION THEREOF, AND COSMETIC CONTAINING THE SAME | Kao Corporation (JP) | 1995-03-01 | — | — | EP | disclosed |
| EP-0243006-B1 | BLOCK-GRAFT COPOLYMERS AND PROCESS FOR PRODUCING THE SAME | Shin-Etsu Chemical Co., Ltd. (JP) | 1992-12-23 | — | — | EP | disclosed |
| US-4803243-A | Block-graft copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1989-02-07 | — | — | US | disclosed |
| EP-0243006-A2 | Block-graft copolymers and process for producing the same | Shin-Etsu Chemical Co., Ltd. (JP) | 1987-10-28 | — | — | EP | disclosed |