Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CNR2 | P34972 | 12/20 | 0.44 |
| ▸ | GRK6 | P43250 | 1/20 | 0.37 |
| ▸ | EGFR | P00533 | 1/20 | 0.37 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.37 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3901022 | 1.00 | CNR2 (0.44) | CNR2GRK6EGFRERBB2DNM1 | |
| SCHEMBL655214 | 0.92 | CNR2 (0.49) | CNR2GRK6EGFRERBB2 | |
| SCHEMBL1815516 | 0.88 | CNR2 (0.46) | CNR2EGFRERBB2DNM1 | |
| SCHEMBL12677177 | 0.88 | CNR2 (0.46) | CNR2EGFRERBB2DNM1 | |
| SCHEMBL14496272 | 0.87 | CNR2 (0.54) | CNR2EGFRERBB2 | |
| SCHEMBL5011771 | 0.87 | CNR2 (0.49) | CNR2GRK6EGFRERBB2 | |
| SCHEMBL1459455 | 0.85 | EGFR (0.44) | CNR2EGFRERBB2DNM1 | |
| SCHEMBL11228670 | 0.85 | CNR2 (0.46) | CNR2EGFRERBB2DNM1 | |
| SCHEMBL5499262 | 0.85 | CNR2 (0.55) | CNR2EGFRERBB2 | |
| SCHEMBL10427123 | 0.85 | SLC2A1 (0.49) | CNR2EGFRERBB2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4701300-A | Polyamide ester photoresist formulations of enhanced sensitivity | MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) | 1987-10-20 | — | — | US | claimed |
| EP-1705007-B1 | Lithographic printing plate precursor and lithographic printing method | FUJIFILM CORP (JP) | 2012-06-06 | — | — | EP | disclosed |
| US-8127675-B2 | Lithographic printing plate precursor and lithographic printing method | FUJIFILM CORPORATION (JP) | 2012-03-06 | — | — | US | disclosed |
| US-20100005989-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORPORATION | 2010-01-14 | — | — | US | disclosed |
| US-7402374-B2 | Method for colored image formation | FUJIFILM CORPORATION (JP) | 2008-07-22 | — | — | US | disclosed |
| EP-1602480-B1 | Method for colored image formation | FUJIFILM CORP (JP) | 2007-12-12 | — | — | EP | disclosed |
| EP-1557262-B1 | Lithographic printing plate precursor and lithographic printing method | FUJIFILM CORP (JP) | 2007-11-14 | — | — | EP | disclosed |
| US-20070092836-A1 | Lithographic printing plate precursor and lithographic printing method | FUJIFILM CORPORATION (JP) | 2007-04-26 | — | — | US | disclosed |
| EP-1717024-A1 | Lithographic printing plate precursor and lithographic printing method | Fuji Photo Film Co., Ltd. (JP) | 2006-11-02 | — | — | EP | disclosed |
| US-20060216642-A1 | Lithographic printing plate precursor and lithographic printing method | FUJI PHOTO FILM CO., LTD. | 2006-09-28 | — | — | US | disclosed |
| EP-1705007-A2 | Lithographic printing plate precursor and lithographic printing method | Fuji Photo Film Co., Ltd. (JP) | 2006-09-27 | — | — | EP | disclosed |
| US-20050271981-A1 | Method for colored image formation | FUJIFILM CORPORATION (JP) | 2005-12-08 | — | — | US | disclosed |
| EP-1602480-A1 | Method for colored image formation | Fuji Photo Film Co., Ltd. (JP) | 2005-12-07 | — | — | EP | disclosed |
| US-20050170282-A1 | Lithographic printing plate precursor and lithographic printing method | FUJI PHOTO FILM CO., LTD. | 2005-08-04 | — | — | US | disclosed |
| EP-1557262-A2 | Lithographic printing plate precursor and lithographic printing method | FUJI PHOTO FILM CO., LTD. (JP) | 2005-07-27 | — | — | EP | disclosed |
| EP-0188205-B1 | PHOTORESIST COMPOSITIONS WITH ENHANCED SENSITIVITY USING POLYAMIDE ESTERS | CIBA-GEIGY AG (CH) | 1988-06-22 | — | — | EP | disclosed |
| US-4701300-A | Polyamide ester photoresist formulations of enhanced sensitivity | MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) | 1987-10-20 | — | — | US | disclosed |
| EP-0188205-A2 | Photoresist compositions with enhanced sensitivity using polyamide esters | CIBA-GEIGY AG (CH) | 1986-07-23 | — | — | EP | disclosed |