⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8094575 | 1.00 | — | — | |
| SCHEMBL30197642 | 0.87 | — | — | |
| SCHEMBL29227678 | 0.87 | — | — | |
| SCHEMBL30457691 | 0.87 | — | — | |
| SCHEMBL8972360 | 0.87 | — | — | |
| Hydrochloric Acid SCHEMBL9059128 | 0.87 | — | — | |
| SCHEMBL10336343 | 0.87 | — | — | |
| SCHEMBL28997700 | 0.87 | — | — | |
| SCHEMBL10336345 | 0.87 | — | — | |
| SCHEMBL31588341 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108642244-A | A kind of metal alloy wave absorbing agent degreasing annealing all-in-one oven and its application method | 广州蓝磁新材料科技有限公司 | 2018-10-12 | — | — | CN | claimed |
| US-9379712-B2 | High speed precessionally switched magnetic logic | INTEL CORPORATION (US) | 2016-06-28 | — | — | US | claimed |
| US-20150341036-A1 | HIGH SPEED PRECESSIONALLY SWITCHED MAGNETIC LOGIC | MANIPATRUNI SASIKANTH (US) | 2015-11-26 | — | — | US | claimed |
| EP-2920827-A1 | HIGH SPEED PRECESSIONALLY SWITCHED MAGNETIC LOGIC | Intel Corporation (US) | 2015-09-23 | — | — | EP | claimed |
| US-9136848-B2 | High speed precessionally switched magnetic logic | INTEL CORPORATION (US) | 2015-09-15 | — | — | US | claimed |
| US-20150194963-A1 | HIGH SPEED PRECESSIONALLY SWITCHED MAGNETIC LOGIC | INTEL CORPORATION | 2015-07-09 | — | — | US | claimed |
| CN-104737318-A | High speed precessionally switched magnetic logic | INTEL CORP | 2015-06-24 | — | — | CN | claimed |
| US-8988109-B2 | High speed precessionally switched magnetic logic | INTEL CORPORATION (US) | 2015-03-24 | — | — | US | claimed |
| US-20140139265-A1 | HIGH SPEED PRECESSIONALLY SWITCHED MAGNETIC LOGIC | INTEL CORPORATION | 2014-05-22 | — | — | US | claimed |
| WO-2014078025-A1 | HIGH SPEED PRECESSIONALLY SWITCHED MAGNETIC LOGIC | INTEL CORPORATION (US) | 2014-05-22 | — | — | WO | claimed |
| CN-103480852-A | Manufacturing method of scaly metal soft magnetic micro powder | ZHENJIANG BAONA ELECTROMAGNETIC NEW MATERIAL CO LTD | 2014-01-01 | — | — | CN | claimed |
| CN-103350225-A | Method for magnetic metal powder flattening rolling | ZHENJIANG BAONA ELECTROMAGNETIC NEW MATERIAL CO LTD | 2013-10-16 | — | — | CN | claimed |
| EP-4342009-A1 | HIGH VOLUME MANUFACTURING OF ALLOY ANODES FOR LI-ION BATTERY | Applied Materials, Inc. (US) | 2024-03-27 | — | — | EP | disclosed |
| US-20220376226-A1 | HIGH VOLUME MANUFACTURING OF ALLOY ANODES FOR LI-ION BATTERY | ELEVATED MATERIALS US LLC | 2022-11-24 | — | — | US | disclosed |
| WO-2022245519-A1 | HIGH VOLUME MANUFACTURING OF ALLOY ANODES FOR LI-ION BATTERY | APPLIED MATERIALS, INC. (US) | 2022-11-24 | — | — | WO | disclosed |
| CN-112391077-A | Insulating soft magnetic ink, insulating soft magnetic film and insulating soft magnetic film laminated circuit board | 肥特补科技股份有限公司 | 2021-02-23 | — | — | CN | disclosed |
| US-20140139265-A1 | HIGH SPEED PRECESSIONALLY SWITCHED MAGNETIC LOGIC | INTEL CORPORATION | 2014-05-22 | — | — | US | disclosed |
| CN-103480852-A | Manufacturing method of scaly metal soft magnetic micro powder | ZHENJIANG BAONA ELECTROMAGNETIC NEW MATERIAL CO LTD | 2014-01-01 | — | — | CN | disclosed |
| CN-103350225-A | Method for magnetic metal powder flattening rolling | ZHENJIANG BAONA ELECTROMAGNETIC NEW MATERIAL CO LTD | 2013-10-16 | — | — | CN | disclosed |
| US-6123899-A | CONCENTRATIONS OF ALLOYING ELEMENTS IN MASTER ALLOY HARDENER ARE A MULTIPLE OF 2 OR GREATER OF THE CONCENTRATIONS OF SUCH ELEMENTS IN BASE ALLOY, AND RATIOS OF ALLOYING ELEMENTS IN MASTER ALLOY HARDENER TO EACH OTHER ARE SAME AS IN BASE ALLOY | KB ALLOYS, INC. (US) | 2000-09-26 | — | — | US | disclosed |