SCHEMBL8098810

SCHEMBL8098810

CC[AlH]O[AlH2].CC[Al](C)O[AlH2]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL912234 0.82
SCHEMBL78997 0.79
SCHEMBL6716393 0.71
SCHEMBL10427361 0.60
SCHEMBL5427582 0.60
SCHEMBL10427580 0.59
SCHEMBL10427694 0.59
SCHEMBL135576 0.56
SCHEMBL9248376 0.55
SCHEMBL969860 0.55

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6110549-A HIGH DENSITY POLYETHYLENE AND A LINEAR LOW DENSITY POLYETHYLENE MADE WITH METALLOCENE CATALYST; SEALANT FILM RESISTANT TO WHITENING, HEAT DEFORMATION AFTER BOILING STERILIZATION, AND HAS HIGH IMPACT STRENGTH MITSUI CHEMICALS INC. (JP) 2000-08-29 US disclosed