SCHEMBL810971

SCHEMBL810971

OC1CCC2CCCCC2C1O

nearest known ligand 0.36

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
CA4 P22748 1/20 0.36
ALDH1A1 P00352 1/20 0.35
CTDSP1 Q9GZU7 2/20 0.34
KDM4E B2RXH2 1/20 0.33
APOBEC3A P31941 1/20 0.33
APOBEC3G Q9HC16 1/20 0.33
TSHR P16473 1/20 0.32
SLC18A3 Q16572 1/20 0.31
PKM P14618 1/20 0.30
HSD11B1 P28845 1/20 0.30
HSD11B2 P80365 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6346433 0.90 CA1 (0.42) CA1CA2CA4ALDH1A1CTDSP1
SCHEMBL11667053 0.88 CA1 (0.32) CA1CA2CA4ALDH1A1CTDSP1
SCHEMBL6355777 0.84 CA1 (0.36) CA1CA2CA4ALDH1A1TSHR
Vinyl Ether SCHEMBL18784357 0.84
SCHEMBL13213063 0.83 CA1 (0.39) CA1CA2CA4ALDH1A1CTDSP1
SCHEMBL2955039 0.83 CA1 (0.39) CA1CA2CA4ALDH1A1CTDSP1
SCHEMBL7180146 0.83 CA1 (0.39) CA1CA2CA4ALDH1A1CTDSP1
SCHEMBL1193772 0.80 HSD17B10 (0.35)
SCHEMBL14307917 0.79 CA1 (0.36) CA1CA2CA4ALDH1A1CTDSP1
SCHEMBL6428213 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220098369-A1 DEGRADABLE RESIN COMPOSITION, DEGRADABLE CURED PRODUCT AND DOWNHOLE TOOL FOR DRILLING MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-03-31 US claimed
EP-3919547-A1 DEGRADABLE RESIN COMPOSITION, DEGRADABLE CURED PRODUCT AND DOWNHOLE TOOL FOR DRILLING MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-12-08 EP claimed
CN-115361868-A High-load solution concentrates of dicamba 巴斯夫公司 2022-11-18 CN disclosed
CN-115179545-A Compositions and articles for additive manufacturing and methods of use thereof 科思创(荷兰)有限公司 2022-10-14 CN disclosed
CN-115179544-A Compositions and articles for additive manufacturing and methods of use thereof 科思创(荷兰)有限公司 2022-10-14 CN disclosed
US-20220098369-A1 DEGRADABLE RESIN COMPOSITION, DEGRADABLE CURED PRODUCT AND DOWNHOLE TOOL FOR DRILLING MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-03-31 US disclosed
EP-3919547-A1 DEGRADABLE RESIN COMPOSITION, DEGRADABLE CURED PRODUCT AND DOWNHOLE TOOL FOR DRILLING MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-12-08 EP disclosed
CN-109121431-B Optical film for organic electroluminescent display device, polarizing film with adhesive layer, and organic electroluminescent display device 日东电工株式会社 2021-07-30 CN disclosed
CN-109312046-B Urethane (meth) acrylate, method for producing urethane (meth) acrylate, curable composition, cured product, and method for producing cured product 三菱瓦斯化学株式会社 2021-04-30 CN disclosed
CN-111918935-A Radiation curable compositions 湛新比利时股份有限公司 2020-11-10 CN disclosed
CN-106459368-B Radiation curable aqueous compositions with controlled polymer flow 湛新比利时股份有限公司 2020-08-25 CN disclosed
US-20070122627-A1 WEATHERABLE, THERMOSTABLE POLYMERS HAVING IMPROVED FLOW COMPOSITION GENERAL ELECTRIC COMPANY (US) 2007-05-31 US disclosed
US-20070027271-A1 WEATHERABLE, THERMOSTABLE POLYMERS HAVING IMPROVED FLOW COMPOSITION GENERAL ELECTRIC COMPANY (US) 2007-02-01 US disclosed
US-7169859-B2 Weatherable, thermostable polymers having improved flow composition GENERAL ELECTRIC COMPANY (US) 2007-01-30 US disclosed
US-20050159577-A1 Weatherable, thermostable polymers having improved flow composition SABIC GLOBAL TECHNOLOGIES B.V. (NL) 2005-07-21 US disclosed
JP-2004352653-A METHOD FOR PRODUCING ALICYCLIC DIEPOXY COMPOUND NEW JAPAN CHEM CO LTD 2004-12-16 JP disclosed
EP-1445266-A2 Photoresist copolymer Daicel Chemical Industries, Ltd. (JP) 2004-08-11 EP disclosed
US-20030180662-A1 Acid-sensitive compound and resin composition for photoresist DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2003-09-25 US disclosed
EP-1000924-A1 ACID-SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST Daichel Chemical Industries Ltd (JP) 2000-05-17 EP disclosed
US-4255301-A HEAT RESISTANCE, PHOTOSTABILITY ARGUS CHEMICAL CORPORATION (US) 1981-03-10 US disclosed