⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Butane SCHEMBL25264062 | 0.96 | CA12 (0.38) | — | |
| Propane SCHEMBL11051481 | 0.96 | CA12 (0.38) | — | |
| Ethane SCHEMBL1285178 | 0.96 | CA12 (0.38) | — | |
| Hydrochloric Acid SCHEMBL5004272 | 0.96 | — | — | |
| Cyclohexane SCHEMBL27230658 | 0.89 | CA12 (0.35) | — | |
| SCHEMBL28519166 | 0.87 | CA12 (0.36) | — | |
| SCHEMBL9329967 | 0.87 | TSHR (0.50) | — | |
| SCHEMBL10496023 | 0.87 | — | — | |
| SCHEMBL4235434 | 0.87 | — | — | |
| SCHEMBL973899 | 0.85 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 449 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114450388-B | Composition for removing etching residues, and use method and application thereof | 弗萨姆材料美国有限责任公司 | 2025-03-21 | — | — | CN | claimed |
| CN-117603056-A | Preparation method of light-colored polyurethane curing agent | 江苏湘园化工有限公司 | 2024-02-27 | — | — | CN | claimed |
| US-20220380705-A1 | Composition For Removing Etch Residues, Methods Of Using And Use Thereof | VERSUM MATERIALS US, LLC (US) | 2022-12-01 | — | — | US | claimed |
| EP-4034629-A1 | COMPOSITIONS FOR REMOVING ETCH RESIDUES, METHODS OF USING AND USE THEREOF | Versum Materials US, LLC (US) | 2022-08-03 | — | — | EP | claimed |
| EP-3320075-B1 | PHOTORESIST CLEANING COMPOSITION USED IN PHOTOLITHOGRAPHY AND A METHOD FOR TREATING SUBSTRATE THEREWITH | VERSUM MAT US LLC (US) | 2022-06-08 | — | — | EP | claimed |
| CN-114450388-A | Composition for removing etching residues, and use method and application thereof | 弗萨姆材料美国有限责任公司 | 2022-05-06 | — | — | CN | claimed |
| EP-3410519-B1 | BINDER COMPOSITION FOR NONAQUEOUS SECONDARY BATTERY ELECTRODES, SLURRY COMPOSITION FOR NONAQUEOUS SECONDARY BATTERY ELECTRODES, ELECTRODE FOR NONAQUEOUS SECONDARY BATTERIES, AND NONAQUEOUS SECONDARY BATTERY | ZEON CORP (JP) | 2021-06-02 | — | — | EP | claimed |
| CN-108026492-B | Photoresist cleaning composition for use in photolithography and method for treating substrate using the same | 弗萨姆材料美国有限责任公司 | 2021-05-28 | — | — | CN | claimed |
| WO-2021061922-A1 | COMPOSITIONS FOR REMOVING ETCH RESIDUES, METHODS OF USING AND USE THEREOF | VERSUM MATERIALS US, LLC (US) | 2021-04-01 | — | — | WO | claimed |
| CN-109517625-B | FCC gasoline processing method | 北京安耐吉能源工程技术有限公司 | 2020-11-20 | — | — | CN | claimed |
| EP-1062938-A1 | Keratinic fibres oxidative dyeing composition and dyeing process | L'OREAL (FR) | 2000-12-27 | — | — | EP | claimed |
| EP-1055409-A1 | Composition for oxidative dyeing of keratinous fibres and dyeing process using same | L'OREAL (FR) | 2000-11-29 | — | — | EP | claimed |
| EP-0240371-B2 | Method of processing lightsensitive silver halide photographic material | KONISHIROKU PHOTO IND (JP) | 1996-01-31 | — | — | EP | claimed |
| EP-0495756-B1 | Process for the preparation of N,N-dihydrocarbylhydroxylamines | CIBA GEIGY AG (CH) | 1994-11-30 | — | — | EP | claimed |
| US-5144075-A | PROCESS FOR THE PREPARATION OF N,N-DIHYDROCARBYLHYDROXYLAMINES | CIBA-GEIGY CORPORATION (US) | 1992-09-01 | — | — | US | claimed |
| EP-0495756-A1 | Process for the preparation of N,N-dihydrocarbylhydroxylamines | CIBA-GEIGY AG (CH) | 1992-07-22 | — | — | EP | claimed |
| EP-0243168-B1 | METHOD FOR PROCESSING SILVER HALIDE PHOTO-SENSITIVE MATERIAL | KONICA CORPORATION (JP) | 1991-10-16 | — | — | EP | claimed |
| US-4963475-A | HETEROCYCLIC MERCAPTAN ANTIFOGGING AGENTS FOR HIGH-SPEED AND STABLE DEVELOPMENT IN AUTOMATIC EQUIPMENT USING CYANINE PHOTOSENSITIVE DYES, AROMATIC PRIMARY AMINE DEVELOPERS AND A HYDROXYL AMINE PRESERVATIVE | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1990-10-16 | — | — | US | claimed |
| EP-0243168-A2 | Method for processing silver halide photo-sensitive material | KONICA CORPORATION (JP) | 1987-10-28 | — | — | EP | claimed |
| EP-0240371-A2 | Method of processing lightsensitive silver halide photographic material | KONICA CORPORATION (JP) | 1987-10-07 | — | — | EP | claimed |