SCHEMBL812307

SCHEMBL812307

CCCCCCCCC(C)=C(C)C(=O)O

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FNTA P49354 2/20 0.67
FNTB P49356 2/20 0.67
THRB P10828 1/20 0.67
PGGT1B P53609 1/20 0.67
GPR84 Q9NQS5 7/20 0.56
PPARG P37231 7/20 0.56
PPARD Q03181 7/20 0.56
PPARA Q07869 7/20 0.56
HDAC11 Q96DB2 5/20 0.56
TSHR P16473 4/20 0.56
PTPN1 P18031 3/20 0.56
ALDH1A1 P00352 2/20 0.56
TLR2 O60603 2/20 0.56
TDP1 Q9NUW8 2/20 0.56
FABP4 P15090 2/20 0.56
KMT2A Q03164 2/20 0.56
SLC22A6 Q4U2R8 1/20 0.56
SLC22A8 Q8TCC7 1/20 0.56
MEN1 O00255 1/20 0.56
ESR1 P03372 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1702510 1.00 FNTA (0.67) FNTAFNTBTHRBPGGT1BGPR84
SCHEMBL3026653 1.00 FNTA (0.67) FNTAFNTBTHRBPGGT1BGPR84
SCHEMBL812305 1.00 FNTA (0.67) FNTAFNTBTHRBPGGT1BGPR84
SCHEMBL3033833 1.00 FNTA (0.67) FNTAFNTBTHRBPGGT1BGPR84
SCHEMBL811607 1.00 FNTA (0.67) FNTAFNTBTHRBPGGT1BGPR84
SCHEMBL1721176 1.00 FNTA (0.67) FNTAFNTBTHRBPGGT1BGPR84
SCHEMBL3026650 1.00 FNTA (0.67) FNTAFNTBTHRBPGGT1BGPR84
SCHEMBL1721171 1.00 FNTA (0.67) FNTAFNTBTHRBPGGT1BGPR84
SCHEMBL2023996 1.00 FNTA (0.67) FNTAFNTBTHRBPGGT1BGPR84
SCHEMBL3033832 1.00 FNTA (0.67) FNTAFNTBTHRBPGGT1BGPR84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111381443-A Positive photosensitive composition and cured film using same 罗门哈斯电子材料韩国有限公司 2020-07-07 CN disclosed
CN-111381446-A Positive photosensitive composition and cured film using same 罗门哈斯电子材料韩国有限公司 2020-07-07 CN disclosed
CN-111240157-A Positive photosensitive resin composition and cured film prepared therefrom 罗门哈斯电子材料韩国有限公司 2020-06-05 CN disclosed
EP-2389397-A1 AQUEOUS POLYMER DISPERSION Bayer MaterialScience AG (DE) 2011-11-30 EP disclosed
US-20110256384-A1 OPTICAL ELEMENT SEIKO EPSON CORPORATION (JP) 2011-10-20 US disclosed
WO-2010083954-A1 AQUEOUS POLYMER DISPERSION BAYER MATERIALSCIENCE AG (DE) 2010-07-29 WO disclosed
EP-0554404-A4 CURABLE LIQUID RESIN COMPOSITION 1993-10-27 EP disclosed
EP-0554404-A1 CURABLE LIQUID RESIN COMPOSITION DSM N.V. (NL) 1993-08-11 EP disclosed
WO-1992006846-A1 CURABLE LIQUID RESIN COMPOSITION DSM DESOTECH, INC. (US) 1992-04-30 WO disclosed