⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27596874 | 0.94 | — | — | |
| SCHEMBL48883 | 0.94 | — | — | |
| SCHEMBL10536939 | 0.89 | — | — | |
| Water SCHEMBL22582743 | 0.89 | — | — | |
| SCHEMBL10536906 | 0.89 | — | — | |
| SCHEMBL9583504 | 0.89 | — | — | |
| SCHEMBL476442 | 0.89 | — | — | |
| Ammonia Solution, Strong SCHEMBL6551274 | 0.89 | — | — | |
| SCHEMBL704170 | 0.89 | — | — | |
| SCHEMBL239458 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6100202-A | Pre deposition stabilization method for forming a void free isotropically etched anisotropically patterned doped silicate glass layer | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY (TW) | 2000-08-08 | — | — | US | disclosed |