SCHEMBL816912

SCHEMBL816912

OCOc1ccc(C2(c3ccc(OCO)cc3)c3ccccc3-c3ccccc32)cc1

nearest known ligand 0.52

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.52
KMT2A Q03164 3/20 0.52
KDM4E B2RXH2 1/20 0.52
LMNA P02545 1/20 0.52
MAPT P10636 1/20 0.52
OPRK1 P41145 1/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
ESR1 P03372 1/20 0.44
ESR2 Q92731 1/20 0.44
POLB P06746 1/20 0.43
PDK2 Q15119 16/20 0.39
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29506891 1.00 MEN1 (0.52) MEN1KMT2AKDM4ELMNAMAPT
SCHEMBL816921 0.92 PDK2 (0.50) MEN1KMT2AKDM4ELMNAMAPT
SCHEMBL16116616 0.92 PDK2 (0.48) MEN1KMT2AKDM4ELMNAMAPT
SCHEMBL14826017 0.89 MEN1 (0.42) MEN1KMT2AKDM4ELMNAMAPT
SCHEMBL30211372 0.86 PDK2 (0.54) MEN1KMT2AKDM4ELMNAMAPT
SCHEMBL29351148 0.86 PDK2 (0.54) MEN1KMT2AKDM4ELMNAMAPT
SCHEMBL194556 0.86 PDK2 (0.54) MEN1KMT2AKDM4ELMNAMAPT
SCHEMBL17050236 0.86 PDK2 (0.54) MEN1KMT2AKDM4ELMNAMAPT
SCHEMBL20994182 0.85 ESR1 (0.45) MEN1KMT2AKDM4ELMNAMAPT
SCHEMBL29557255 0.85 ESR1 (0.45) MEN1KMT2AKDM4ELMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024075643-A1 THERMOPLASTIC RESIN COMPOSITION AND OPTICAL MEMBER COMPRISING SAME 帝人株式会社 2024-04-11 WO disclosed
US-20240010834-A1 THERMOPLASTIC RESIN AND OPTICAL MEMBER INCLUDING SAME TEIJIN LIMITED (JP) 2024-01-11 US disclosed
CN-116417182-A Anisotropic conductive film and connector thereof 安徽昱微材料科技有限公司 2023-07-11 CN disclosed
US-10655028-B2 Ink jet recording method and ink set SEIKO EPSON CORPORATION (JP) 2020-05-19 US disclosed
CN-105270000-B Recording method and printer 精工爱普生株式会社 2019-03-19 CN disclosed
US-9896569-B2 Polycarbonate resin composition and molded article IDEMITSU KOSAN CO., LTD. (JP) 2018-02-20 US disclosed
US-20180045872-A1 POLARIZING PLATE WITH PHASE-DIFFERENCE LAYER AND IMAGE DISPLAY DEVICE NITTO DENKO CORPORATION (JP) 2018-02-15 US disclosed
US-20170283550-A1 POLYCARBONATE RESIN MITSUBISHI CHEMICAL CORPORATION (JP) 2017-10-05 US disclosed
US-9709702-B2 Special polycarbonate polarizing eyewear MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2017-07-18 US disclosed
US-9627655-B2 Display device and method for manufacturing same NITTO DENKO CORPORATION (JP) 2017-04-18 US disclosed
US-20130108841-A1 INK JET RESIN INK COMPOSITION, INK JET RECORDING METHOD, AND RECORDED MATTER SEIKO EPSON CORPORATION (JP) 2013-05-02 US disclosed
US-20130085254-A1 POLYCARBONATE RESIN AND TRANSPARENT FILM FORMED THEREFROM MITSUBISHI CHEMICAL CORPORATION (JP) 2013-04-04 US disclosed
US-20130029045-A1 COATING LIQUID FOR INK JET AND INK JET RECORDING METHOD USING THE SAME SEIKO EPSON CORPORATION (JP) 2013-01-31 US disclosed
US-20120308796-A1 POLYCARBONATE RESIN AND TRANSPARENT FILM FORMED THEREFROM NITTO DENKO CORPORATION (JP) 2012-12-06 US disclosed
US-20120226011-A1 METHOD FOR PRODUCING POLYCARBONATE ASAHI GLASS COMPANY, LIMITED 2012-09-06 US disclosed
US-20110298143-A1 COPOLYCARBONATE AND OPTICAL LENS TEIJIN CHEMICALS LTD. (JP) 2011-12-08 US disclosed
US-8058384-B2 Method for producing thermoplastic resin, polyester resin and polycarbonate resin, and their applications MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2011-11-15 US disclosed
US-20100144995-A1 METHOD FOR PRODUCING THERMOPLASTIC RESIN, POLYESTER RESIN AND POLYCARBONATE RESIN, AND THEIR APPLICATIONS MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-06-10 US disclosed
US-7541416-B2 Comprises 30 to 70 mol % of a structural unit comprising a bisphenyl fluorene structure and 70 to 30 mol % of a structural unit comprising tricyclo [5.2.1.02.6] decanedimethanol and causes little occurrence of a birefringence; high transparency, excellent heat resistance; optics MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2009-06-02 US disclosed
US-20070123685-A1 Polycarbonate copolymer and process for producing the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-05-31 US disclosed