Charcoal, Activated

Charcoal, Activated

SCHEMBL8202111

FC(F)(F)C(F)(F)F.[C]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL44994 0.91
Iodide SCHEMBL1728387 0.83
SCHEMBL727990 0.83
SCHEMBL6229785 0.83
SCHEMBL7615072 0.83
SCHEMBL729133 0.83
Ammonia Solution, Strong SCHEMBL18261967 0.83
Hydrochloric Acid SCHEMBL4433430 0.83
SCHEMBL3741599 0.83
SCHEMBL9101079 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118635502-A Method for extracting narrow-band gap metal fullerene by in-situ derivatization of perfluoroethane 井冈山大学 2024-09-13 CN claimed
EP-1048337-A1 Recovery of perfluorinated compounds from the exhaust of semiconductors fabrications with recycle of vaccum pump dilutent AIR PRODUCTS AND CHEMICALS, INC. (US) 2000-11-02 EP disclosed
US-6032484-A Recovery of perfluorinated compounds from the exhaust of semiconductor fabs with recycle of vacuum pump diluent AIR PRODUCTS AND CHEMICALS, INC. (US) 2000-03-07 US disclosed
US-5882424-A Plasma cleaning of a CVD or etch reactor using a low or mixed frequency excitation field APPLIED MATERIALS, INC. (US) 1999-03-16 US disclosed