SCHEMBL820495

SCHEMBL820495

Fc1c(F)c(F)c([Ti](C2=CC=CC2)(C2=CC=CC2)c2c(F)c(F)c(F)c(F)c2F)c(F)c1F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5270316 0.91
SCHEMBL5916011 0.91
SCHEMBL5915975 0.90
SCHEMBL9315435 0.88
SCHEMBL2500946 0.86
SCHEMBL5915861 0.85
SCHEMBL9004716 0.84
SCHEMBL9653327 0.83
SCHEMBL5915892 0.83
SCHEMBL5915899 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 133 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200369930-A1 ADHESIVE COMPOSITION FOR TOUCH SENSOR AND OPTICAL LAMINATE USING THE SAME DONGWOO FINE-CHEM CO., LTD. (KR) 2020-11-26 US claimed
US-10428247-B2 Adhesive composition for touch sensor and optical laminate using the same DONGWOO FINE-CHEM CO., LTD. (KR) 2019-10-01 US claimed
US-20180134930-A1 ADHESIVE COMPOSITION FOR TOUCH SENSOR AND OPTICAL LAMINATE USING THE SAME DONGWOO FINE-CHEM CO., LTD. (KR) 2018-05-17 US claimed
US-20180134929-A1 ADHESIVE COMPOSITION FOR TOUCH SENSOR AND OPTICAL LAMINATE USING THE SAME DONGWOO FINE-CHEM CO., LTD. (KR) 2018-05-17 US claimed
US-6664025-B2 Ethylenically unsaturated monomer capable of free radical addition polymerizatio catalysis; binder, photoinitiator and cyanopyidone sensitizer; metallocene and onium coninitiators KODAK POLYCHROME GRAPHICS LLC 2003-12-16 US claimed
US-20030180635-A1 Visible radiation sensitive composition KODAK (NEAR EAST) INC. 2003-09-25 US claimed
US-6051366-A A PHOTORESIST MIXTURE COMPRISING A METALLOCENE PHOTOINITIATOR AND AN ONIUM COMPOUND AS A COINITIATOR; FOR USE IN PRINTING PLATES KODAK POLYCHROME GRAPHICS LLC (US) 2000-04-18 US claimed
EP-0447930-B1 Photopolymerisable composition and recording material produced therefrom AGFA GEVAERT AG (DE) 1997-07-09 EP claimed
JP-2233704-A None JP disclosed
JP-4221958-A None JP disclosed
US-12610853-B2 Curable composition for inkjet and air cavity formation, electronic component, and method for manufacturing electronic component SEKISUI CHEMICAL CO., LTD. (JP) 2026-04-21 US disclosed
US-12528956-B2 Ink-jet adhesive, method for producing electronic component, and electronic component SEKISUI CHEMICAL CO., LTD. (JP) 2026-01-20 US disclosed
US-20260001274-A1 METHOD FOR PRODUCING THREE-DIMENSIONAL OBJECT MIMAKI ENGINEERING CO., LTD. (JP) 2026-01-01 US disclosed
WO-2025123893-A1 ELECTROPLATING-RESISTANT COMPOSITION AND DRY FILM PREPARED THEREFROM, CURED PRODUCT, AND ELECTRODE FOR SOLAR CELL 太阳油墨(苏州)有限公司 2025-06-19 WO disclosed
JP-H04221958-A PHOTOPOLYMERIZABLE MIXTURE AND RECORDING MATERIAL MADE OF SAME HOECHST AG 1992-08-12 JP disclosed
EP-0497552-A1 Photopolymerisable compositions National Starch and Chemical Investment Holding Corporation (US) 1992-08-05 EP disclosed
US-5075467-A Reacting organotitanium halide with lithium amide CIBA-GEIGY CORPORATION (US) 1991-12-24 US disclosed
US-4963470-A PHOTOINITIATORS CIBA-GEIGY CORPORATION (US) 1990-10-16 US disclosed
US-4960746-A A-HYDROXY-OR A-AMINO-ACETOPHENONES AND A TITANOCENE COMPOUND SUBSTITUTED BY FLUORINE CIBA-GEIGY CORPORATION (US) 1990-10-02 US disclosed
JP-H02233704-A COATED OPTICAL FIBER SUMITOMO ELECTRIC IND LTD 1990-09-17 JP disclosed