⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20111213 | 0.79 | — | — | |
| SCHEMBL20111209 | 0.79 | — | — | |
| SCHEMBL20111207 | 0.79 | — | — | |
| SCHEMBL13143523 | 0.79 | — | — | |
| SCHEMBL2458384 | 0.76 | — | — | |
| SCHEMBL2458386 | 0.76 | — | — | |
| SCHEMBL11855190 | 0.76 | — | — | |
| SCHEMBL1028749 | 0.76 | — | — | |
| SCHEMBL8717086 | 0.70 | POLB (0.32) | — | |
| SCHEMBL10293774 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12032287-B2 | Resist material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-09 | — | — | US | disclosed |
| US-20210063873-A1 | RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-03-04 | — | — | US | disclosed |
| WO-2008024922-A2 | 8-HYDROXYQUINOLINE COMPOUNDS AND METHODS THEREOF | WYETH (US) | 2008-02-28 | — | — | WO | disclosed |