Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.37 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.36 |
| ▸ | NAAA | Q02083 | 2/20 | 0.35 |
| ▸ | CHRM3 | P20309 | 4/20 | 0.33 |
| ▸ | HTT | P42858 | 2/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL825471 | 1.00 | EPHX1 (0.37) | EPHX1CYP19A1NAAACHRM3HTT | |
| SCHEMBL825568 | 0.88 | EPHX1 (0.36) | EPHX1CYP19A1NAAACHRM3HTT | |
| SCHEMBL16200766 | 0.88 | CHRM2 (0.30) | CHRM3 | |
| SCHEMBL13805190 | 0.88 | EPHX1 (0.45) | EPHX1CYP19A1NAAACHRM3HTT | |
| SCHEMBL16200778 | 0.87 | EPHX1 (0.44) | EPHX1CYP19A1NAAACHRM3HTT | |
| SCHEMBL131168 | 0.85 | EPHX1 (0.41) | EPHX1CYP19A1NAAACHRM3HTT | |
| SCHEMBL131137 | 0.85 | EPHX1 (0.41) | EPHX1CYP19A1NAAACHRM3HTT | |
| SCHEMBL132092 | 0.85 | EPHX1 (0.41) | EPHX1CYP19A1NAAACHRM3HTT | |
| SCHEMBL132522 | 0.83 | EPHX1 (0.39) | EPHX1CYP19A1NAAACHRM3HTT | |
| SCHEMBL131074 | 0.83 | EPHX1 (0.39) | EPHX1CYP19A1NAAACHRM3HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8142977-B2 | mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator | FUJIFILM CORPORATION (JP) | 2012-03-27 | — | — | US | disclosed |
| US-20080241749-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |